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《Ordnance Material Science and Engineering》 2012-02
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Progress in preparation of CIO film

LANG Ye1,HU Lizhong1,ZHANG Heqiu1,NING Zhimin2,DU Jianfeng2,GAO Zhuo2(1.School of Physics and Optoelectronic Technology,Dalian University of Technology,Dalian 116023,China; 2.Unit 66109 of PLA,Qinhuangdao 066000,China)  
With the rapid development and the widespread application of reconnaissance and dynamic tracking technology,the one-way or two-way transparency in battlefield is increasing.It will be difficult to deal with reconnaissance and guidance such as infrared,laser,radar if photoelectric technology is not comprehensively used in confrontation.CIO is a kind of high performance transparent semiconductor material.By adjusting the doping concentration,it is possible to realize the high infrared reflection and high permeability of the visible light.But the complexity of CIO film system and the defective large area preparation techniques for pure CIO film seriously hamper its actual application in the photoelectric warfare and the infrared protection.In this paper,a variety of preparation methods for CIO film are reviewed,and the application of CIO film in the field of infrared protection is emphatically introduced.
【CateGory Index】: TB383.2
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