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Laser Holographic Lithography and Applications

Song Dengyuan (Department of Electronics and Informational Engineering,Hebei University,Baoding 071002) Wang Xiaoping (Zhangjiakou Vocational University,Zhangjiakou 075000)  
The basic principle and development of the laser holographic lithography are des cribed with emphasis on the applications in photoelectronic devices such as the manufacture of grating and field emission displays(FEDs).
【CateGory Index】: TN305.7
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1 JIANG Xue-hua(Department of Physics, Linyi Teachers′ College, Linyi Shandong 276005, China);The Development of Field Emission Research[J];Journal of Nanyang Teachers' College;2003-09
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【Secondary References】
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1 Ye Shujuan1,2 Qin Li1 Qi Xiaodong1,2 Hu Yongsheng1,2 Zhang Nan1,2 Ning Yongqiang1 Wang Lijun1 1Key Laboratory of Excited States Processes,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun,Jilin 130033,China 2Graduate University of Chinese Academy of Sciences,Beijing 100049,China;Emission Characteristics of Second-Order Distributed Feedback Semiconductor Lasers[J];Chinese Journal of Lasers;2010-09
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