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《Semiconductor Technology》 2004-06
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Design and manufacture of 63.5mm×127mm UT 1X reticle

SU Peng-yi1,2, CHEN Kai-sheng1, CAO Zhuang-qi1(1. Shanghai Optical Lithography Electronic Engineering Co. Shanghai, 200233, China; 2. Shanghai Jiao Tong University, Shanghai 200030, China)  
The 63.5mm×127mm UT 1X reticle is introduced, which is compatible with the original76.2mm×127mm UT 1X reticle on the same UltraTech stepper. Relevant data handling and toolutilities are modified to adapt the manufacture of this new type photomask. The throughput of the127mm×127mm blank is doubled and the manufacture procedure is accelerated with less castoff.Thus the cost is reduced and it is good for the environment protection too.
【CateGory Index】: TN305.7
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【Citations】
Chinese Journal Full-text Database 3 Hits
1 SU Peng-yi1, CHEN Kai-sheng2, CAO Zhuang-qi1(1.Shanghai Jiao Tong University, Shanghai 200030, China;2. Shanghai Optical Lithography Electronic Engineering Co. Shanghai, 200052, China);Sizing issue in the data handling of photomask[J];Semiconductor Technology;2003-07
2 Su Peng-yi1, CHEN Kai-sheng2, CAO Zhuang-qi1(1. Shanghai Jiao Tong University, Shanghai 200030, China;2. Shanghai Optical Lithography Electronic Engineering Co. Ltd., Shanghai 200052, China);Pattern automatic placement system for photomask based on FSM model[J];Semiconductor Technology;2003-10
3 FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of;Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction[J];Opto-electronic Engineering;2001-01
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 SU Peng-yi1,2,CHEN Kai-sheng1,CAO Zhuang-qi2(1.Shanghai Optical Lithography Electronic Engineering Co.,Shanghai 200233,China;2.Shanghai Jiao Tong University,Shanghai 200030,China);Computer simulation for photomask pattern processing[J];Micronanoelectronic Technology;2004-11
2 Liu Juan~(1,2),Zhang Jin~1,and Feng Boru~1(1 State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China)(2 Graduate School of Chinese Academy of Science,Beijing 100039,China);Comparison Between Imaging Interferometric Lithography and Off-Axis Illumination Lithography[J];Chinese Journal of Semiconductors;2005-07
3 ZHAO Wei1, 2, CHENG Xiu-lan1 (1.Shanghai Jiao Tong University, Shanghai 200030,China;2.Semiconductor Manufacturing International Corporation., Shanghai 201200,China);The Relationship Between Resist and Pre-layer Pattern Research for the Effect of Yield in PSM Process[J];Electronics & Packaging;2008-10
4 FENG Bo-ru1, ZHANG Jin1,2, ZONG De-yong1, JIANG Shi-lei1 (1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; 2. Department of Physics, Sichuan University, Chengdu 610054, China);A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers[J];Opto-electronic Engineering;2003-01
5 LIU Juan, FENG Bo-ru, ZHANG Jin ( 1. State Key Laboratory of Optical Technologies for Microfabrication, The Institute of Optics and Electronics, The Chinese Academy of Sciences, Chengdu 610209, China ; 2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China );Imaging interferometric lithography and its spatial frequency analysis[J];Opto-electronic Engineering;2004-10
6 LIU Jia,ZHANG Xiao-ping ( School of Information Science and Engineering, Lanzhou University, Lanzhou 730000, China );Application of Extended Fourier Diffraction Theory for Alternating Phase Shift Mask[J];Opto-Electronic Engineering;2008-01
7 FAN Jianxing YANG Huazhong WANG Hui (EDA Laboratory,Department of Electronic Engineering, Tsinghua University, Beijing, 100084, CHN);Simulating Standing-wave Effect in Photoresist with Optical Transmission Matrix[J];Research & Progress of Solia State Electronics;2002-03
8 YUAN Qiongyan~(1,2) WANG Xiangzhao~(1,2) SHI Weijie~3 LI Xiaoping~4 1 Information Optics Laboratory,Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800 2 Graduate School of the Chinese Academy of Sciences,Beijing 100039 3 Research Center of Laser Information Technology Shenzhen Graduate School,Harbin Institute of Technology,Shenzhen 518055 4 School of Mechanical Science and Engineering,Huazhong University of Science and Technology,Wuhan 430074;Development of Immersion Lithography[J];Laser & Optoelectronics Progress;2006-08
9 YUAN Qiongyan1,2 WANG Xiangzhao1,21 Information Optics Laboratory,Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800 2 Graduate University of Chinese Academy of Science,Beijing 100039;Recent Development of International Mainstream Lithographic Tools[J];Laser & Optoelectronics Progress;2007-01
10 WANG Hong(Dept.of Basic Products,China Electronics Technology Group Corporation,Beijing 100846,P.R.China);State of the Art of Si-Based Integrated Circuit Technology[J];Microelectronics;2007-04
【Secondary Citations】
Chinese Journal Full-text Database 2 Hits
1 Feng Boru, Sun Guoliang, Shen Feng, Que Long (State Key Laboratory of Optical Technology for Microfabrication,Institute of Optics & Electronics, Chinese Academy of Sciences,Chengdu,610209) Chen Baoqin (Microelectronics Center,Chinese Academy of Scie;Optical Microlithographic Phase-Shifting Mask Technology[J];Opto-electronic Engineering;1996-S1
2 FENG Bo ru, ZHANG Jin, HOU De sheng ZHOU Chong xi, CHEN Fen (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209,China);Optical Microlithography with Attenuated Phase Shifting Mask[J];OPTO-ELECTRONIC ENGINEERING;1999-05
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