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《Semiconductor Technology》 2004-07
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Sputtering technology of nano thin films

JIA Jia(Shanghai Institute of Technical Physics, Shanghai 200083, China)  
On the basis of the summarization of nano film material preparation, two potentialtechnologies——ion beam sputter deposition and magnetron sputtering method are proposed.. Theprinciple, preparation methods, properties and applications of nano film materials have beensummarized. The development and application prospects of nano film materials and its preparationmethods are also estimated.
【CateGory Index】: TB383
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