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《Semiconductor Technology》 2005-06
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Technology & Applications of Scattering with Angular Limitation in Projection Electron-Beam Lithography

CHENG Li, ZHAO Qian, WANG Zhen-yu, ZHU Jun, FAN Mu-hong, LIU He-xiang (Institute of Electricity & Information, Jiangsu University, Zhenjiang 212013, China)  
In the next generation of lithography(NGL), scattering with angular limitation in projection electron-beam lithography(SCALPEL) is one of the first-selected schemes for ICs, for its technique is simple and the cost is relatively low. The operating principle, processing technique and method of SCALPEL as well as its system are discussed, its technical superiority in NGL and the main points of application are contrastively analyzed.
【Fund】: 江苏省高校自然科学研究基金项目(02KJB510005)
【CateGory Index】: TN305
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