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《Semiconductor Technology》 2005-06
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Application Performance of Photoresist in IC Field

MA Jian-xia,WU Wei-guo,ZHANG Qing-zhong,JIA Yu-ming (Micro Electronic and Solid Electronic Institute , UESTC of China ,Chengdu 610054,China)  
Photoresist technology is the important constitute of exposure technology, high performance resolution can be attained by using high performance exposure tools with matched high performance photoresist .The Paper mainly found on the application of photoresist in the process of IC fabrication to summarize the facets of reaction mechanism ,performance index parameters and finally to indicate some new development directions in terms with process evolution target.
【CateGory Index】: TN405
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