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《Semiconductor Technology》 2005-06
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Application Performance of Photoresist in IC Field

MA Jian-xia,WU Wei-guo,ZHANG Qing-zhong,JIA Yu-ming (Micro Electronic and Solid Electronic Institute , UESTC of China ,Chengdu 610054,China)  
Photoresist technology is the important constitute of exposure technology, high performance resolution can be attained by using high performance exposure tools with matched high performance photoresist .The Paper mainly found on the application of photoresist in the process of IC fabrication to summarize the facets of reaction mechanism ,performance index parameters and finally to indicate some new development directions in terms with process evolution target.
【CateGory Index】: TN405
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【References】
Chinese Journal Full-text Database 9 Hits
1 Ll Jun-ping, ZHANG Wei-min, WANG Mei-li, PU Jia-ling(Lab Printing & Packaging Material and Technology, Beijing Institute of Graphic Communication, Beijing 102600, China);A Novel Method to Set Up Calibration Curves for Measuring Acid-generation of PAG in polymer films[J];Information Recording Materials;2007-03
2 ZHANG Shan1,WANG Lei2(1.Department of Electrical Engineering & Information Technology,Shandong University of Science & Technology,Jinan 250031,China;2.Institute of Ultra-precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin 150001,China);Optical Proximity Correction for Low Resolution Acoustooptic Modulator[J];Opto-Electronic Engineering;2012-04
3 ZHANG Zhi-hui,LIN Bao-ping(School of chemistry and chemical Engineering,Southeast University,Nanjing 210096,China);Preparation and Characterization of Methacrylate Photoresist[J];Jiangsu Chemical Industry;2007-04
4 JIANG Xiao-ping,ZUO Xiang,CAI Feng,YANG Hui(College of Materials Science and Engineering,Nanjing University of Technology,Nanjing 210009,Jiangsu,China);Synthesis of 4-Acetoxystyrene via Catalytichydrogenation Method[J];Fine Chemicals;2011-09
5 WENG Zi-xiang a,HUANG Bi-wu b,CHEN Wei-qing b,YANG Zhi-hong b(a.College of Science;b.College of Material Science and Engineering,Nanchang University,Nanchang 330031,China);Preparation of the UV-curing Coating with Bisphenol A Type Epoxy Resin as a Main Component and Study on Its Properties[J];Journal of Nanchang University(Natural Science);2010-03
6 Xu Qinchang;Huang Biwu;Yong Tao;Dengchong;Zhou Kuan;Cheng Guiliang;School of Material Science and Engineering, Nanchang University;;STUDY ON THE INFLUENCE OF NANOSILICA ON PROPERTIES OF THE ACRYLATE UV-CURING COATING[J];Speciality Petrochemicals;2013-05
7 Wei Biming;Jin Mingliang;Wu Hao;Dou Yingying;Zhou Guofu;Shui Lingling;Institute of Electronic Paper Displays,South China Academy of Advanced Optoelectronics,South China Normal University;;Study on Bar Coating Process for Large-Area Photoresist Coating[J];Journal of South China Normal University(Natural Science Edition);2015-02
8 HE Jiao,GUO Wen-xun,PENG Dang,HE Qian(College of Materials and Engineering,Hunan University,Changsha 410082,China);Synthesis and properties of methylacrylate photoresist matrix resin[J];Applied Chemical Industry;2011-02
9 Zhang Fusheng;Benxi City of biomedicine engineering and technical center;;Production and wastewater treatment of linear phenolic resin[J];Chemical Intermediates;2013-11
【Citations】
Chinese Journal Full-text Database 10 Hits
1 Liu Mingda; Li Shuwen (Jilin Universlty Region of National integrated Optoelectronics Laboratory ,Changchun 130023) Shi Sujiao (Jilin Industrial University, Changchun 130012);PHotolithography of 0. 4μm Linewidth[J];SEMICONDUCTOR OPTOELECTRONICS;1994-04
2 LIU Jian-hai; CHEN Kai-sheng; CAO Zhuang-qi (Advanced Semiconductor Manufacture Co. Ltd. Shanghai 200233, China; Optical Lithography Corp., Shanghai 200001 China; Shanghai Jiao Tong University, Shanghai 200030, China);Application of lithography technology in microelectronics manufacturing[J];Semiconductor Technology;2001-08
3 Wang Yangyuan and Kang Jinfeng(Institute of Microelectronics,Peking University,Beijing 100871,China);Development and Challenges of Lithography for ULSI[J];Chinese Journal of Semiconductors;2002-03
4 LIU Jia-feng, HU Gun-gang, ZONG Ren-he (Hefei University Technology Electric and Automatic Project Institute, Hefei 230009, China);The Application and Development of Lithography Technology for Microelectronics Equipment in New Century[J];Optoelectronic Technology & Information;2004-01
5 ZHENG Jinhong, HUANG Zhiqi, HOU Hongsen (Beijing Institute of Chemical Reagents,Beijing 100022,P.R.China);EVOLUTION AND PROGRESS OF DEEP UV 248 nm PHOTORESISTS[J];Photographic Science and Photochemistry;2003-05
6 SHEN Beijun, WANG Runwen, LU Dunwu (Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800)WANG Liding, LIANG Jingqiu, YAO Jingsong (Changchun Institute of Optics and Fine Mechanics, Chinese Academy;GGSTUDY OF DIRECT DEEPETCH PHOTORESIST VIA KrF EXCIMER LASER ABLATION[J];JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES;1998-02
7 XIE Chang qing,YE Tian chun (The 3rd lab of Microelectronics R&D Centre CAS,Beijing 100010,China);Gurrent Research Status of x Ray Lithography[J];MICROFABRICATION TECHNOLOGY;1999-03
8 XIAO Xiao, DU Jing lei, GUO Yong kang,YANG Jing,XIE Shi wei (Physics Department of Sichuan University, Chengdu 610064,China);Study on New Method of Reducing Standing Wave Effects in Lithography[J];Microfabrication Technology;2002-04
9 Zeng Xianglin;Song Baiquan;Zhao Xiaolin;Cai Bingchu(Information stonge Research Center,Shanghai Jiao Tong University,Shanghai 200030);INVESTIGATION OF SHRINKAGE OF PHOTORESIST IN ION BEAM ETCHING[J];MICROFABRICATION TECHNOLOGY;1994-03
10 Cui Zheng(Central Microstructure Facility,Rutherford Appleton Laboratory,Chilton ,Didcot,Oxon Ox110 QX,UK);PRESENT AND FUTUKE OF VLSILITHOGRAPHY TECHNOLOGY[J];MICROFABRICATION TECHNOLOGY;1995-03
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 YAN Jin-liang(Department of Physics, Yantai Normal University, Yantai 264025, CHN);Electrostatic Comb Actuator Membrane Deformable Mirrors[J];Semiconductor Optoelectronics;2005-01
2 YAN Jin-liang (Department of Physics,Yantai Normal University,Yantai 264025,CHN);Micromachined Continuous Membrane Deformable Mirrors[J];Semiconductor Optoelectronics;2005-03
3 CHEN Fang,GAO Hong-jun,LIU Zhong-fan (College of Chemistry and Molecular Engineering,Peking University,Beijing 100871,China);Hot embossing lithography[J];Micronanoelectronic Technology;2004-10
4 Fan Jianxing,Yang Huazhong and Wang Hui(EDA Laboratory,Department of Electronic Engineering,Tsinghua University,Beijing 100084,China);Simulating Technique with Virtual Film Inserting for Photoresist Exposure[J];Chinese Journal of Semiconductors;2002-08
5 DENG Xi-shu, WU Yun-xin, LI Jian-ping (College of Mechanical and Electrical Engineering ,Central South University ,Hunan Changsha 410083;);Structure Design and Simulation Study of Precision Vibration-reduction Control System for Experimental Work Table ofthe Stepping-Scanning Lithography[J];Equipment For Electronic Products Manufacturing;2005-10
6 DENG Xi-shu, WU Yun-xin, YANG Fu-qiang, WANG Yong-hua (College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China);Design and Manufacture on Precision Positioning System of Wafer Stage for a Simulated Macro-motion System of Lithography[J];Equipment for Electronic Products Manufacturing;2007-02
7 ZHANG Zhenyu,DENG Jianguo,LIU Yingkun(The 13th Research Institute of CETC,Shijiazhuang 050051, China);Large Area High Resolution Photolithography Technology[J];Equipment for Electronic Products Manufacturing;2009-03
8 CHENG Dan,LU Bing-heng,DING Yu-cheng,WANG Li(State Key Lab for Manufacturing Systems Engineering,Xi’an Jiaotong University,Xi’an 710049,China);Model for the calculation of slant grating alignment signals of room-temperature imprint lithography[J];Opto-electronic Engineering;2005-10
9 LIU Jia,ZHANG Xiao-ping ( School of Information Science and Engineering, Lanzhou University, Lanzhou 730000, China );Application of Extended Fourier Diffraction Theory for Alternating Phase Shift Mask[J];Opto-Electronic Engineering;2008-01
10 LI Hong-jun, ZHAO Jing-li, LU Zhen-wu, LIAO Jiang-hong, WENG Z hi-cheng (The State Key Laboratory of Applied Optic,Changchun Institute o f Optical and Fine Mechanics,Chinese Academy of Sciences,Changchun 130022);Linewidth Error in Fabrication of Binary Optical Element[J];Journal of Optoelectronics.laser;2000-03
China Proceedings of conference Full-text Database 1 Hits
1 SHAO Zhu-feng;TIAN Shu-zhong;WANG Jia-jia;WANG Hui;NIE Lan-jian;WANG Lei;FU Bo;China Building Materials Academy;Shandong Agriculture and Engineering University;;The influence factor in study on silica galss photomask substrate during chemically mechanical polishing[A];[C];2015
【Co-references】
Chinese Journal Full-text Database 10 Hits
1 Fang Hongxia~1,Wu Qianglin~(1,2),Ding Yunsheng~2,Liu Dongyin~1,Zheng Yu~1,Shen Xuemei~1 (1.Applied Chemistry Laboratory Huangshan University,Huangshan 245041,China; 2.Institute of Chemical Engineering and Polymer Materials,Hefei University of Technology,Hefei 230009,China);PREPARATION AND CHARACTERIZATION OF NOVOLAC PF WITH HIGH SOFTENING POINT AND LOW FREE PHENOL[J];Engineering Plastics Application;2011-11
2 LI Xiang-dong,YANG Jia-de (Chongqing Optoelectronics Research Institute,Chongqing 400060,China);Research and Development on Organic Electroluminescent Display Devices[J];SEMICONDUCTOR OPTOELECTRONICS;2000-03
3 WU Zhe-fu 1, ZHANG Xian-min 1, SUN Run-guang 2, LI Wen-lian 3,CHEN Kang-sheng 1 (1.Dept. of Information and Electronic Engineering, Zhejiang University, Hangzhou 310027,China; 2.Department of Physics, The Ohio State University, Columbus, Ohio, USA; 3.C;Energy Transfer in Organic Electroluminescent Devices[J];SEMICONDUCTOR OPTOELECTRONICS;2000-03
4 LIU Zhong an (National Flat Panel Display Engineering Technology Research Center, Nanjing Electronic Devices Institute, Nanjing 210016, China)$$$$;Optimization of Photolithography Process Parameters[J];Semiconductor Optoelectronics;2001-01
5 WU Youzhi, SUN Runguang, ZHENG Xinyou, JIANG Xueyin, ZHANG Zhilin, XU Shaohong(Department of Materials Science, Shanghai University, Shanghai 201800, CHN);Carrier Trapping Mechanism in Doped Organic Electroluminescent Devices[J];Semiconductor Optoelectronics;2003-05
6 SHI Rui-ying, GUO Yong-kang (Phys. Dept. Sichuan University, Chengdu 610064 China; Microelectronics Center, Academia Sinica, Beijing 100010, China);Optical proximity correction for improving pattern quality in submicron photolithography[J];Semiconductor Technology;2001-03
7 LIU Jian-hai; CHEN Kai-sheng; CAO Zhuang-qi (Advanced Semiconductor Manufacture Co. Ltd. Shanghai 200233, China; Optical Lithography Corp., Shanghai 200001 China; Shanghai Jiao Tong University, Shanghai 200030, China);Application of lithography technology in microelectronics manufacturing[J];Semiconductor Technology;2001-08
8 CAO Li-xin( The 13th Research Institute,CETC, Shijiazhuang 050051, China);Actuality and development of ultra-clean and high purechemical reagents and photoresists in China[J];Semiconductor Technology;2003-12
9 CHEN Ya-ying , ZHU Yu (Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084,China);Research and Prospect on Ultra Precision Table System Equipped with Electrorheological Fluid Units[J];Semiconductor Technology;2005-03
10 Song Dengyuan (Dept.of Electronics and Information Eng.Hebei Univ.Baoding 071002) Wang Xiaoping (Zhangjiakou Vocational University,zhangjiakou 075000);Advance of Optical Lithography Technology[J];SEMICONDUCTOR TECHNOLOGY;1998-02
【Secondary References】
Chinese Journal Full-text Database 10 Hits
1 HE Ya-xiong,LIU Qi-cheng,GONG Du-ming(1.School of Physics and Electronics,Changsha University of Science and Technology,Changsha 410004,China);Preparation and properties of the acrylics resin used in photosensitive paste[J];Journal of Changsha University of Science & Technology(Natural Science);2012-03
2 Chen Jianshan Zhou Gang(School of Material Science and Engineering, Central South University of Forestry and Technology,Changsha 410004);Research progress in photosensitive resin[J];New Chemical Materials;2012-12
3 DENG Chong,HUANG Bi-wu,ZHOU Kuan,CHENG Gui-liang, HU Qiu-fa,CHEN Wei-qing(School of Materials Science and Engineering,Nanchang University,Nanchang 330031,China);Synthesis of 4-Tert-butyl Phenol Glycidyl Ether Acrylate and Its Application in UV-curable Coating[J];Journal of Nanchang University(Engineering & Technology);2013-02
4 XU Qinchang,HUANG Biwu,LIU Shimin,YANG Zhihong,CHEN Weiqing(School of Material Science and Engineering,Nanchang University,Nanchang 330031,China);Preparation and characterization of 1,4-cyclohexanedimethanol glycidyl ether by cationic type UV-curing prepolymer[J];Journal of Nanchang University(Natural Science);2013-03
5 Xu Qinchang;Huang Biwu;Yong Tao;Dengchong;Zhou Kuan;Cheng Guiliang;School of Material Science and Engineering, Nanchang University;;STUDY ON THE INFLUENCE OF NANOSILICA ON PROPERTIES OF THE ACRYLATE UV-CURING COATING[J];Speciality Petrochemicals;2013-05
6 DENG Chong;HUANG Biwu;ZHOU Kuan;CHEN Weiqing;HU Kaichuang;XU Qinchang;School of Material Science and Engineering,Nanchang University;;UV-curable properties of a synthetic O-cresol glycidyl ether acrylate[J];Journal of Nanchang University(Natural Science);2014-02
7 LIU Bo;LI Yong;XIAO Jun;CHEN Yunlei;XIAO Jian;College of Material Science and Technology,Nanjing University of Aeronautics and Astronautics;;UV-curing Process and Mechanical Properties of Bisphenol A Epoxy Resin[J];Acta Aeronautica et Astronautica Sinica;2014-05
8 LIU Wen-jie;XU Jiao;ZUO Shi-xiang;YAO Chao;LUO Jun;Petroleum Engineering College of Changzhou University;Changzhou University R & D Center of Xuyi Attapulgite;Jiangsu Autebang International Co.Ltd.;;Surface Modification of Nanometer Attapulgite and Its Application on Epoxy Acrylate Resin[J];Fine Chemicals;2015-01
9 FENG Bo;AI Zhao-quan;ZHU Chao;SONG Meng-yao;Minisistry of Education Key Laboratory for Synthesis and Application of Organic Functional Molecules,Faculty of Chemistry and Engineering,Hubei University;;Research progress of matrix resin for photoresist[J];Adhesion;2015-02
10 Huang Biwu;Wan Shice;Xie Wangfu;School of Material Science and Engineering,Nanchang of University;;SYNTHESIS AND PERFORMANCE TEST OF A NOVEL UV-CURING PHOTOSENSITIVE PREPOLYMER[J];Speciality Petrochemicals;2015-01
【Secondary Citations】
Chinese Journal Full-text Database 5 Hits
1 Lin Hongyi(Dept.of Electronic Engineering,Beijing Institute of Technology,Beijing 100081);Progress in Nanoelectronics[J];ACTA ELECTRONICA SINICA;1995-02
2 Yao Hanming,Zhou Mingbao,Tian Hong (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu,610209);Microlithography Technologies Marching toward 21st Century[J];OPTO-ELECTRONIC ENGINEERING;1999-01
3 ;World's Ic Industry Faces the 21st Century[J];SCIENCE & TECHNOLOGY REVIEW;1997-05
4 WEN Shangming YUAN Dafa TANG Yong SUN Qiuyan BAI Dekai (Institute of Optics and Electronics,CAS,Chengdu 610209);Strategic Study on the Development of Microelectronic Microfabrication Equipment and Technologies in 21st Century[J];WORLD SCI-TECH R & D;2000-01
5 FENG Bo?ru,ZHANG Jin,HOU De?sheng,CHEN Fen (State Key Lab of Optical Technologies for Microfabrication,Institute of Optics &. Electronics,Chinese Academy of Sciences, Chengdu, 610209,China);Progress of Optical Microlithography[J];MICROFABRICATION TECHNOLOGY;2000-01
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