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《Semiconductor Technology》 2006-06
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Technologies and Applications of Electron Beam Exposure

WANG Zhen-yua, CHENG Lib, ZHU Junb, LI Lanb(a.Institute of Applied Science and Technology;b.Institute of Electricity & Information, Jiangsu University, Zhenjiang 212013, China)  
Several e-beam exposure technologies are described, which are recently used andbeing developed, such as scanning electron microscope, gauss electron beam lithograph, moldingbeam and projection beam lithograph, etc. Applications and prospects of those technologies are alsocompared and analyzed.
【Fund】: 江苏大学高级人才启动项目(1283000149);; 江苏省高校自然科学研究基金项目(04KJB310171)
【CateGory Index】: TN405.7
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