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《Semiconductor Technology》 2007-06
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Study on Microchannel Plate Etching Technique

YAN Cheng1,WANG Yi-jun2,DENG Guang-xu1 (1.North Night Vision Technology Co.,Ltd.,Xi'an 710100,China;2.Department of Physics,Xianyang Normal College,Xianyang 712000,China)  
According to characteristics of core and clad glass material of microchannel plate(MCP),the kind of etch liquid(HCl and NaOH liquid) in the process of etching microchannel plate(MCP) was chosen.By the vacuum presses difference method and microscopic appearance,the channel etched progress of MCP was analyzed and examined in the etching process.Making use of measuring the mass decrease of MCP in the etching process,the etching degree and result were measured and examined.According to analyzing experiment result,the effective etching technical(sour-alkali-sour)and technological parameter were provided.The core and core-clad spreading layer glass were etching completely,and the clad glass was protected.The results show that the smooth channel and stable double electron emissive layer were became.
【Fund】: 国家部委预研项目(404050510113)
【CateGory Index】: TN152
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【References】
Chinese Journal Full-text Database 1 Hits
1 Yan Cheng1,Wang Yijun2,Zhang Zhengjun1,Su Detan1,Cong Xiaoqing1,Wang Ruiting3(1.North Night Vision Technology Co.,Ltd.,Beijing 100089,China;2.Dept.of Physics,Xianyang NormalCollege,Xianyang 712000,China;3.Beijing Sevenstar Huachuang Electronic Co.,Ltd.,Beijing 100016,China);Development of Cleaning Equipment for Microchannel Plate[J];Semiconductor Technology;2008-03
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【Co-citations】
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1 CHENG Li1, LI Chun-ming2,WANG Zhen-yu1, GAO Ping1(Institute of Electricity & Information, Jiangsu University, Zhenjiang 212013, China);The measures of new technology & development in IC industrial chain[J];Semiconductor Technology;2004-06
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