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《Semiconductor Technology》 2010-01
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Study on the Surface State of Mg-Al Alloy CMP

Zhang Yan,Liu Yuling,Niu Xinhuan,Liang Pu,Xiao Wenming,Yan Baohua(Institute of Microelectronics,Hebei University of Technology,Tianjin 300130,China)  
High-precision,low roughness and no-damage surface can be obtained by CMP technology.CMP technology is expanded into processing of Mg-Al alloy and the Mg-Al alloy CMP mechanism was discussed.The influence of pH value,pressure,flow rate,rotational speed on Mg-Al alloys surface state was analyzed.The results show that when pH value is 11.20,the pressure is 0.06 MPa,flow rate is 200mL/min,rotational speed is 60r/min,the optimal surface state can be observed with Olympus microscope.Such results are benefit for the further study of Me-Al alloy surface machining by CMP technology.
【Fund】: 国家自然基金资助项目(10676008);; 河北省教育厅科学研究计划项目(2007429)
【CateGory Index】: TG146.22
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