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《Micronanoelectronic Technology》 2003-02
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Applications of mix & match plate-making technology using E-beam and optics for the development of GaAs devices

LUO Si-wei, WANG Wei-jun, JIANG Ze-liu, LIU Yu-gui (Hebei Semiconductor Research Institute, Shijiazhuang 050051, China)  
The paper introduces the mix match plate-making technology using E-beam and optical facilities for the development of GaAs devices, i.e. using an optical tool to make all the mask plates except the gate layer, using a high resolution E-beam tool to make the gate plate, which contains fine lines less than 0.5μm, and can precisely overlay with other layers. The method of precise overlaying mask plates by two different kinds of tools, and the process of dry etching, and so on, are given in this paper.
【CateGory Index】: TN605
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【Co-references】
Chinese Journal Full-text Database 10 Hits
1 DENG Tao, LI Ping, DENG Guang-hua (Chongqing Optoelectronics Research Institute,Chongqing 400060,CHN);Analysis on Defect Sources in Photolithographic Process[J];Semiconductor Optoelectronics;2005-03
2 LIANG Ying-xin,WANG Tai-hong (Institute of Physics,Chinese Academy of Sciences,Beijing100080,China);A new technique for fabrication of nanodevices-nanoimprint lithography[J];Semiconductor Information;2003-04
3 Ren Liming1,Wang Wenping1,Chen Baoqin2,Zhou Yi1,Huang Ru1 and Zhang Xing1(1 Department of Microelectronics,School of Electronics Engineering and Computer Science,Peking University,Beijing 100871,China) (2 Institute of Microelectronics,The Chinese Academy of Sciences,Beijing 100029,China)[WT5”HZ];Microfabrication of Nano-Scale Feature Lines[J];Chinese Journal of Semiconductors;2004-12
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