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《Micronanoelectronic Technology》 2003-02
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Applications of mix & match plate-making technology using E-beam and optics for the development of GaAs devices

LUO Si-wei, WANG Wei-jun, JIANG Ze-liu, LIU Yu-gui (Hebei Semiconductor Research Institute, Shijiazhuang 050051, China)  
The paper introduces the mix match plate-making technology using E-beam and optical facilities for the development of GaAs devices, i.e. using an optical tool to make all the mask plates except the gate layer, using a high resolution E-beam tool to make the gate plate, which contains fine lines less than 0.5μm, and can precisely overlay with other layers. The method of precise overlaying mask plates by two different kinds of tools, and the process of dry etching, and so on, are given in this paper.
【CateGory Index】: TN605
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