Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Semiconductor Information》 2003-04
Add to Favorite Get Latest Update

A new technique for fabrication of nanodevices-nanoimprint lithography

LIANG Ying-xin,WANG Tai-hong (Institute of Physics,Chinese Academy of Sciences,Beijing100080,China)  
Nanoimprint lithography(NIL)can be used as a new technique for mass production of nanometer-scaled features.This technique has many advantages such as easy operation,high reso-lution,high repetition,low man-hour ,and low cost etc.This paper gives a brief review of two methods of soft lithogra phy-microcontact printing and micromolding in capillaries.It narrats the working procedures of NIL(mainly pointing hot-embossing lithography)-fabrication of mold,imprint process,pattern transfer,equipment for nanoimprint and pattern precision etc.It also discusses another method of NIL-step-and-flash lithography.At last,it shows some applied ex-amples of NIL in fabrication of electronic devices,data storage,photodetectors and light emit-ters,biochips and micro-fluid devices.
【Fund】: 国家重点基础研究专项经费;; 自然科学基金资助课题(69925410和19904015)
【CateGory Index】: TB383
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
【References】
Chinese Journal Full-text Database 5 Hits
1 YANG Ying-ge,BIAN Zhi-xin,WU Chun-ying,XIAO Hu-wei (Institute of Science & Technical Information of Shanghai,Shanghai 200031,China);Patent Analysis on Nanoimprint Technique[J];Micronanoelectronic Technology;2007-03
2 WANG Shouxu, HE Wei, SUN Rui(School of Micro Electron and Solid Electron, UESTC, Chengdu 610054);Development of Surface Patterning in Nano-electronic Devices[J];Materials Review;2006-09
3 YANG Xiangrong, ZHANG Ming, WANG Xiaolin,CAO Wanqiang(School of Physics and Electronic Technology, Hubei University, Wuhan 430062);Current Status and Development of Emerging Photoetching Technology[J];Materials Review;2007-05
4 XIAO Shi-zhuo,ZOU Ying-quan(College of chemistry,Beijing Normal University,Beijing 100875,China );The Progress of Study on UV Nanoimprint Resists[J];Information Recording Materials;2009-05
5 Li Weijun(National Light Source Quality Supervision Testing Center(Shanghai),China National Lighting Fitting Quality Supervision Testing Center,Shanghai Alpha Lighting Equipment Testing Ltd.,Shanghai 200233);Improvement of the External Quantum Efficiency of GaN-based LEDs[J];China Light & Lighting;2010-03
【Co-references】
Chinese Journal Full-text Database 10 Hits
1 DENG Tao, LI Ping, DENG Guang-hua (Chongqing Optoelectronics Research Institute,Chongqing 400060,CHN);Analysis on Defect Sources in Photolithographic Process[J];Semiconductor Optoelectronics;2005-03
2 CHEN Xian-zhong,YAO Han-min,CHEN Xu-nan,LI Zhan,SHI Jian-ping (State Key Lab.of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu610209,China);Nanoimprint lithography technology[J];Semiconductor Information;2002-12
3 BAI Chun-li;Nano-technology——to fully understand its meaning and guide its development[J];Semiconductor Information;2003-01
4 LIANG Ying-xin,WANG Tai-hong (Institute of Physics,Chinese Academy of Sciences,Beijing100080,China);A new technique for fabrications of nanodevices-nanoimprint lithography(Continued)[J];Semiconductor Information;2003-05
5 TIAN Feng,HAN Li ,YANG Zhong-shan (Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing100080,China);Application of chemically amplified resists in electron beam lithography[J];Micronanoelectronic Technology;2003-12
6 LIU Jing quan,CAI Bing chu,CHEN Di,ZHU Jun, ZHAO Xiao lin,YANG Chun sheng (Research Institute of Micro/Nanometer Science & Technology,Shanghai Jiao tong University,Shanghai 200030,China);SU-8 photoresist and its application in MEMS[J];Micronanoelectronic Technology;2003-Z1
7 SHEN Hai-jun,SHI You-jin(Nanjing University of Aeronautics & Astronautics,Nanjing 210016,China);Nano-electronic components and nano-electronic technology[J];Micronanoelectronic Technology;2004-06
8 ZHU Zhao-ying1,WU Jian-zhong1,GU Chang-geng2,LIU Yan-bo1(1.College of Mechanical Engineering,Tongji University,Shanghai 200092,China;2.Shanghai Technology Promotion Center(STPC),Shanghai 200092,China);Research of Transfer Layer Process Based on UV-NIL[J];Micronanoelectronic Technology;2006-10
9 YANG Ying-ge,BIAN Zhi-xin,WU Chun-ying,XIAO Hu-wei (Institute of Science & Technical Information of Shanghai,Shanghai 200031,China);Patent Analysis on Nanoimprint Technique[J];Micronanoelectronic Technology;2007-03
10 Wang Yangyuan and Kang Jinfeng(Institute of Microelectronics,Peking University,Beijing 100871,China);Development and Challenges of Lithography for ULSI[J];Chinese Journal of Semiconductors;2002-03
【Secondary References】
Chinese Journal Full-text Database 9 Hits
1 Zhou Huia,Yang Haifengb (a.Sun Yueqi Honors College;b.School of Mechatronic Engineering,China University of Mining and Technology,Xuzhou 221008,China);Research Status and Prospect of the Lithography and Micro-Nano Manufacturing Technology[J];Micronanoelectronic Technology;2012-09
2 YOU Zhen-zhou(Department of Mechanical Engineering,Wenzhou Vocational and Technical College,Wenzhou 325035,China);Hydraulic system in hot-embossing machine for microfluidic chip[J];Mechanical & Electrical Engineering Magazine;2007-05
3 Wu Feifei,Huang Lucheng (School of Economics & Management,Beijing University of Technology,Beijing 100124,China);Study on the Diffusion Capacity of New Technical Knowledge Base on Patents[J];Science & Technology Progress and Policy;2012-17
4 Jia Jia et al.;Research on the Application of Technical Innovation Based on the Analysis of Core Patent[J];Information Studies:Theory & Application;2009-01
5 LIU Wei-guo,SHEN Ping(Micro-optoelectronic Systems Laboratory,Xi'an Technological University,Xi'an 710032,China);Simulation of Micro-embossing of Viscoelastic Polymer[J];Journal of Xi'an Technological University;2010-06
6 ;基于文献统计分析法的专利计量分析研究[J];Modern Information;2008-02
7 YANG Chong2,LI Guan-qun1,LIU Da-wei1,LI Zhao-ying1,WANG Yi1,2(1.MLS Inc.,Zhongshan Guangdong 528415,China;2.School of Applied Physics and Materials,Wuyi University,Jiangmen Guangdong 529020,China);The Research Progress on the Improvement of LED External Quantum Efficiency[J];Advanced Display;2012-05
8 YOU Zhen-zhou;Design and Control of Hydraulic System in High Accuracy Micro-nano Embossing Machine[J];Chinese Hydraulics & Pneumatics;2007-06
9 ZHANG Zhi-wan;XU Jia-yan;CHEN Xing-lin;QIANG Sheng;School of Astronautics,Harbin Institute of Technology;;Model Establishing and Control Simulation of the Reticle Stage Micropositioner for Lithography[J];Techniques of Automation and Applications;2014-11
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved