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A new technique for fabrication of nanodevices-nanoimprint lithography

LIANG Ying-xin,WANG Tai-hong (Institute of Physics,Chinese Academy of Sciences,Beijing100080,China)  
Nanoimprint lithography(NIL)can be used as a new technique for mass production of nanometer-scaled features.This technique has many advantages such as easy operation,high reso-lution,high repetition,low man-hour ,and low cost etc.This paper gives a brief review of two methods of soft lithogra phy-microcontact printing and micromolding in capillaries.It narrats the working procedures of NIL(mainly pointing hot-embossing lithography)-fabrication of mold,imprint process,pattern transfer,equipment for nanoimprint and pattern precision etc.It also discusses another method of NIL-step-and-flash lithography.At last,it shows some applied ex-amples of NIL in fabrication of electronic devices,data storage,photodetectors and light emit-ters,biochips and micro-fluid devices.
【Fund】: 国家重点基础研究专项经费;; 自然科学基金资助课题(69925410和19904015)
【CateGory Index】: TB383
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