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《Micronanoelectronic Technology》 2003-12
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Making rutile by using magnetron sputtering

GUO Xing-long 1 ,YU Xian-jin 2 ,XUE Cheng-shan 1 ,DONG Zhi-hua 1 ,GAO Hai-yong 1(1.Institute of Semiconductors,Shandong Normal University,Jinan250014,China;2.College of Chemical Engineering,Shandong University of Technology,Zibo255012,China)  
TiO 2 with20nm in diameter have been prepared by using magnetron sputtering tech-nique.The structure of these powders was determined by X-ray diffraction.The average grain size and particle size in these powders were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy,respectively.The thin films were investigated by XRD,SEM.
【CateGory Index】: TN305
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