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《Micronanoelectronic Technology》 2003-Z1
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Nanoindentation and nanoscratch measurements on the mechanical properties of SiO_2 film

ZHANG Hai xia 1,ZHANG Tai Hua 2,HUAN Yong 2 (1.Institute of Microelectronics,Peking University,Beijing100871,China; 2. State Key Lab of Nonlinear Mechanics,Institute of Mechanics,Chinese Academy of Sciences,Beijing100080,China)  
Studies of the nanoindentation and nanoscratch were performed on the SiO 2 coatings with the thickness of 1.0μm on Si (100) fabricated respectively by LPCVD, PECVD and thermal oxide to evaluate the effect of the fabrication processes on their mechanical properties. The data showed that the hardness and modulus of the SiO 2 coating fabricated by the thermal oxide were highest, and the interfacial adhesive strength between SiO 2 and Si fabricated by LPCVD was higher than PECVD. Nanoindentation and nanoscratch tests can provide more information about the near surface elastic plastic deformation and fracture properties.
【Fund】: 973项目 (G19990 3 3 10 9);; 教育部重点项目 (0 2 16);; 中科院知识创新工程项目 (KJCX2 SW L2 )
【CateGory Index】: TN304.05
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