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《Micronanoelectronic Technology》 2003-Z1
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The growth of ZnO nano-film by RF magnetic sputtering

LI Jing 1, WU Sun tao 1,ZHONG Can 1,2 (1.Pen Tung Sah MEMS Research Center, Xiamen University,Xiamen 361005,China; 2. Department of Physics,Xiamen University,Xiamen 361005,China)  
ZnO nano films were prepared using RF magnetic sputtering technology in different conditions. The properties of film crystal and surface morphology were characterized by X-ray diffraction, scanning electron microscopy, and atomic force microscopy.
【Fund】: 国家自然科学基金重大研究计划(90 2 0 60 3 9);; 国家重点基础研究发展规划 (0 0 1CB610 5 0 5)
【CateGory Index】: TN304.05
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【References】
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