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《Micronanoelectronic Technology》 2004-12
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Fabrication and application of InN films

XIE Zi-li,ZHANG Rong,BI Zhao-xia,LIU Bin,XIU Xiang-qian,GU Shu-lin,JIANG Ruo-lian,HAN Ping,ZHU Shun-ming,SHEN Bo,SHI Yi,ZHENG You-dou(Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials Science and Technology,Department of Physics,Nanjing University,Nanjing 210093,China)  
Due to the great application potential and the secrets of the character s having been revealed,the InN material is one of the most attractive materials in recent two years. In this paper,the basic properties of InN were introduced. The growth techniques and applications of InN material were discussed. Finally,s ome questions and the prospect of the InN material in the future were given.
【Fund】: 国家重点基础研究发展规划资助项目(G2000068305);; 国家高技术研究发展规划项目(2001AA3111102003AA311060);; 国家自然科学基金项目(699760146980600669987001);; 国家杰出青年基金项目(60025411);; 江苏省自然科学基金重点项目资助(BK2003203)
【CateGory Index】: TN304.2
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