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Textured ZnO Transparent Conductive Thin Film Prepared by Mid-Frequency Magnetron Sputtering

LIU Jia-yu1,2,YANG Rui-xia1,NIU Chen-liang1,XUE Jun-ming2,ZHAO Ying2,GENG Xin-hua21.School of Information Engineering,Hebei University of Technology,Tianjin 300130,China;2.Institute of Photo-Electronic Thin Film Devices and Technique of Nankai University,Key Laboratory of Photoelectronics Thin Film Devices and Technique of Tianjin,Key Laboratory of Optoelectronic Information Science and Technology,Chinese Ministry of Education,Tianjin 300071,China  
The smooth ZnO film with high conductivity and high transmission was obtained by mid-frequency magnetron sputtering.The resistivity of the film is 5.57×10-4 Ω·cm,the carrier concentration is 2.2×1020 cm-3 and the Hall mobility is 40.1 cm2/V·s.The avarage transmissivity is 85% within the visible range(400~800 nm).The textured ZnO was gained by post-deposition chemical etching.The influence of sputtering pressure and sputtering temperature on the structure of textured ZnO was analyzed.The textured ZnO for thin film solar cells was obtained.
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