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《Micronanoelectronic Technology》 2010-08
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Focusing and Leveling in Dual-Stage Lithographic Systems

Li Jinlong1,2,Zhao Lixin1,Hu Song1,Zhou Shaolin1,2(1.Institute of Optics & Electronics,Chinese Academy of Sciences,Chengdu 610209,China;2.Graduate School of Chinese Academy of Sciences,Beijing 100039,China)  
With the rapid development of lithography resolution,the focus depth is being reduced,it is serious to make full use of the limited focus depth to complete efficient wafer exposure.The principle of leveling and focusing in scanner and dual-stage lithographic system was compared,including the principle of focus detecting based on the dual-grating and scan path planning,the algorithm of the wafer height information transforming to leveling data such as the defocus and tilt,the servo control systems in leveling and focusing procedure for the exposure position,etc.The comparison between two lithographic systems in theory was made.Finally,a set of leveling results was used to prove the superior of the dual-stage lithographic system to the scanner in leveling and focusing,which pointed out the trend of development in leveling and focusing technology.
【Fund】: 国家科技重大专项(2009ZX02308-002)
【CateGory Index】: TN305.7
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