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《Micronanoelectronic Technology》 2011-09
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Preparation and Performance of the Ni-Mn-Ga Magnetron Sputtering Target Material Alloy

Chen Fenghua,Zhang Mingang,Chai Yuesheng,Yang Libin,Xiong Jie (College of Materials Science and Engineering,Taiyuan University of Science and Technology,Taiyuan 030024,China);  
According to the difference of the sputtering yield and target material composition for the various elements of the Ni-Mn-Ga target materials alloy in the process of magnetron sputtering,the effect of the thin film composition was analyzed,and the Ni55Mn24.5Ga20.5 targets were prepared.The martensitic transformation temperature of the Ni55Mn24.5Ga20.5 targets is higher than the room temperature.Without the standard for the Ni-Mn-Ga martensite PDF card,the prepared alloy X-ray diffraction peak was calibrated by using the simulation and consulting the relative literature.Due to the difficulty of the phase transformation temperature measurement for the film by differential scanning calorimetry(DSC),the method for the film phase transformation temperature measurement through the M-T curve of the martensite and the parent phase was presented,and the alloy was validated.The preparation of the alloy with 450 K Curie temperature provides an experimental basis for exploring the impact of the film composition on the magnetic properties further.
【Fund】: 山西省自然科学基金(2010011032-1);; 山西省研究生创新基金(20093096);; 太原市大学生创新创业专题项目(100115154)
【CateGory Index】: O484.1
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