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《CHINESE JOURNAL OF SEMICONDUCTORS》 2000-08
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Fame:A Fast Detailed Placement Algorithm for Standard\| Cell Layout Based on Mixed Mincut and Enumeration

YAO Bo, HOU Wen\|ting, HONG Xian\|longand CAI Yi\|ci)(Department of Computer Science and Technology, Tsinghua University, Beijing\ 100084, China)  
Rapid progress in manufacturing greatly challenges to the VLSI physical design in both speed and performance. A fast detailed placement algorithm, FAME is presented in this paper, according to these demands. It inherits the optimal positions of cells given by a global placer and exact position to each cell by local optimization. FM Mincut heuristic and local enumeration are used to optimize the total wirelength in y and x directions respectively, and a two way mixed optimizing flow is adopted to combine the two methods for a better performance. Furthermore, a better enumeration strategy is introduced to speed up the algorithm. An extension dealing with blockages in placement has also been discussed. Experimental results show that FAME runs 4 times faster than RITUAL and achieves a 5% short in total wirelength on average.
【Fund】: Project Supported by National Natural Science Foundation of China( Grant No.697760 2 7) and by National973 Key Projectof China (
【CateGory Index】: TN402
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