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《Journal of Beijing University of Chemical Technology》 1990-04
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Study on Automatic Network Matching for Plasma or Reactive lon Etching

Su Zheng (Beijing Instruments Factory) Lü Yanshan (Beijing Institute of Chemical Technology) Wang Yide (Beijing Instrument Factory)  
In this paper the circuit for power transmission from the radio-frequency generator to the vacuum chamber of a plasma or reactive ion etching device has been analysed based upon the theory of distributed parameters circuitry. A formula for calculating the parameters of the Ltyped match network has been derived by means of twin-port network analysis. A new approach to automatic matching using nonlinear selfoptimization control strategy has been proposed in accordance with the relationship between the photo-electric signal caused by the radio-frequency discharge and the reflected lpower. With the 8301 single chip microprocessor as its principal hardware and an improved success-failure coordinate turn-taking method as the algorithm of its software a selfoptimizing match unit has been developed.
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