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《JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING》 1994-03
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Microstructure of Diamond Thin Films by Microwave Plasma CVD

Yuan Yi;Yang Baoxiong;Bai Yuanqiang;Wang Jianjun;Lu Fanxiu(Department of Marterials Science and Engineering,USTB,Beijing 100083, PRC)  
The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth.
【Fund】: 技术新材料专家委历会资助
【CateGory Index】: O484.1
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【References】
Chinese Journal Full-text Database 2 Hits
1 HUANG Yuan-sheng 1, LOU Cheng-ping 2, QIU Wan-qi 2 (1. Department of Mechano-electronic Engineering , Shaoguan University Shaoguan, 512005, China; 2.College of Mechanical Engineering, South China University of Technology Guangzhou, 510640, China);Crystal Defects and Impurities of CVD Diamond Films[J];China Surface Engineering;2004-01
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【Co-references】
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1 Guo Zhimeng; Yin Sheng; Lai Heyi(Department of Material Science and Engineering, USTB, Beijing 100083 PRC);Microstructure of Diamond Films Deposited by CFD[J];JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING;1995-03
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1 Chen Keqiao and Xu Yong ( Kunming University of Science and engineering, Kunming 650093 );Present Situation and Development Trends of Application Research on Microwave Energy[J];Sichuan Nonferrous Metals;1999-01
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