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《Surface Technology》 2007-06
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The Development of the Nanometer TiO_2 Preparation at Low Temperature

WANG Bin1,YAN Jun1,DU Shi-guo1,CUI Hai-ping2(1.the 3rd Department of Ordnance Engineering College,Shijiazhuang 050003,China)(2.Physics and Chemistry Section of Ordnance Engineering College,Shijiazhuang 050003,China)  
Titanium dioxide thin film as a kind of solely catalytic material has extensive application in several fields.However,the traditional preparation technology needs the high temperature sintering normally,this kind of film needs high temperature resistant base,which has restricted its scope of application.Additionally,the high temperature sintering makes crystal grain grow up easily;it is active to have restricted smooth photocatalysis.This article represents the method of preparing nanometer titanium dioxide at low temperature,and individually corresponding features and problems are analyzed.Existing state of the study,especially the main tendency in future is also described.
【Fund】: 国家自然科学基金(50572122);; 军械工程学院院基金(YJJXM0626)资助项目
【CateGory Index】: TB383.1
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