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《Journal of Beijing Institute of Graphic Communication》 2013-02
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Study of Aluminum Films Deposited by Atomic Layer Deposition

ZHAO Qiaoqiao,SANG Lijun,CHEN Qiang(Beijing Key Laboratory of Printing & Packaging Materials and Technology,Beijing Institute of Graphic Communication,Beijing 102600,China)  
Atomic layer deposition was a technique of thin film preparation,which was widely used in the deposition of oxide and nitride but the reports of metal films were less.In order to study metal films prepared by atomic layer deposition,the aluminum films were grown in the equipment of atomic layer deposition assisted through electron cyclotron resonance plasma using trimethylaluminum and hydrogen as the precursor and reductant respectively.Self-controlled parameters for trimethylaluminum and H2 were determined,and X-ray diffraction,atomic force microscope,four point probe were used to measure the structure and property of the as-deposited films.The results showed that the aluminum films could be successfully deposited using plasma-assisted atomic layer deposition technique and the substrate temperature influenced the deposition rate and surface topography of the films.After annealing in hydrogen atmosphere,the crystal structure of as-deposited films was improved and the surface resistance was also significantly decreased.
【CateGory Index】: TB43
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Chinese Journal Full-text Database 4 Hits
1 WU Yi-yong, LI Bang-sheng, WANG Chun-qing(Harbin Institute of Technology, Harbin 150001, China);Theory and Applications of Atomic Layer Deposition[J];Equipment For Electronic Products Manufacturing;2005-06
2 CHENG Bing-xun1,2,WU Wei-dong1,HE Zhi-bing1,XU Hua1,TANG Yong-jian1,LU Tie-cheng2(1.Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China;2.Department of Physics,Key Laboratory for Irradiation Physics and Technologyof Ministry of Education,Sichuan University,Chengdu 610064,China);Effects of annealing temperature on microstructure and electric properties of Al Films[J];High Power Laser and Particle Beams;2008-01
3 SHEN Can,LIU Xiong-ying,HUANG Guang-zhou(College of Electronic and Information Engineering,South China University of Technology,Guangzhou 510640,China);Atomic layer deposition and its applications in semiconductor[J];Vacuum;2006-04
4 Sang Lijun,Zhang Yuefei,Chen Qiang*,Li Xingcun(Key Laboratory of Beijing for Graphic & Packaging Material and Technology,Beijing Institute ofGraphic Communication,Beijing 102600,China);Growth of Al_2O_3 Films by Pulsed Electron Cyclotron Resonance Plasma Deposition[J];Chinese Journal of Vacuum Science and Technology;2010-03
Chinese Journal Full-text Database 10 Hits
1 YUAN Jun-ping1,2,LI Wei1,GUO Wen-xian1(1.College of Science & Technology,Jinan University,Guangzhou 510632,China;2.Guangzhou Panyu Polytechnic,Guangzhou 511483,China);The Research Progress of Precursors for Atomic Layer Deposition[J];Surface Technology;2010-04
2 LIU Heng,XIONG Yu-qing,WANG Ji-zhou(Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics,Lanzhou 730000,China);Analysis of Aluminum Deposition on Inner Wall of Pipes with Atomic Layer Deposition[J];Surface Technology;2012-03
3 WANG Zhiyu,JIAO Gangcheng,FAN Huiqing(State Key Laboratory of Solidification Processing,School of Materials Science and Engineering,Northwestern Polytechnical University,Xi’an 710072);Principle and Application of Ferroelectric Films by Atomic Layer Deposition[J];Materials Review;2007-S1
4 YUAN Jun-ping, GUO Wen-xian, MA Chun-yu, CAI Ji-ye Department of Chemistry, Jinan University, Guangzhou 510632, China;Application of atomic layer deposition technology in anti-tarnish for silver adornments[J];Electroplating & Finishing;2011-02
5 Lin Dawei1 Guo Chun1,2 Zhang Yundong1 Li Bincheng1 1 Institude of Optics and Electrics,Chinese Academy of Sciences,Chengdu,Sichuan 610209,China 2 Graduate University of Chinese Academy of Sciences,Beijing 100049,China;Preparation on Vacuum Ultraviolet Reflective Aluminum Films[J];Acta Optica Sinica;2012-02
6 SANG Lijun1,ZHAO Qiaoqiao1,HU Zhaoli2,LI Xingcun1,LEI Wenwen1,CHEN Qiang1(1.Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication, Beijing 102600,China;2.Patent Examination Cooperation Center of the Patent Office, State Intellectual Property Office,Beijing 100190,China);Research on Atomic Layer Deposition of Alumina Thin Film with Plasma Assisted[J];High Voltage Engineering;2012-07
7 ZHANG Zhimin1,2,GUO Changyou2,MA Bo1,LING Fengxiang2,MIAO Sheng1,2,SHEN Zhiqi2,WENG Lei1(1.School of Chemistry and Material Science,Liaoning Shihua University,Fushun 113001,Liaoning,China; 2.Sinopec Fushun Research Institute of Petroleum and Petrochemicals,Fushun 113001,Liaoning,China);Application of atomic layer deposition technology in modification of porous alumina by titanium[J];Industrial Catalysis;2012-06
8 HE Xiaokun,ZUO Ran,XU Nan,YU Haiqun (School of Energy and Power Engineering,Jiangsu University,Zhenjiang 212013);Review of Growth Mechanism for Ⅲ-Ⅴ Compound Semiconductor by Atomic Layer Epitaxy[J];Materials Review;2012-17
9 LIAO Rong1,2,ZHANG Haiyan1,XIE Jialiang2,YANG Tiezheng2, LUO Wenzhong2,HU Wei2(1 School of Materials and Energy,Guangdong University of Technology,Guangzhou 510090;2 School of Electronic and Information Engineering,South China University of Technology,Guangzhou 510641);Study on Application of Atomic Layer Depositing Zinc Oxide for Buffer Layer to Copper Indium Gallium Selenium Solar Battery[J];Materials Review;2013-12
10 Li Haibo Li Zhaohong Zhao Qiuling Wang Xia~*(Institute of Photonic-Electronic Technology of Mathematics and Physics Department,Qingdao University of Science and Technology,Qingdao 266042);The Application of Vapor Deposition Technique in Creating High Refractive Index Photonic Crystals[J];Chemistry;2008-02
【Secondary Citations】
Chinese Journal Full-text Database 7 Hits
1 SONG Xue-ping, WANG Pei-hong,SUN Zao-qi (School of Physics and Material Science,Anhui University,Hefei 230039,China);Effect of annealing temperature on the microstructure and optical constants of Al film[J];Journal of Anhui University(Natural Sciences);2005-03
2 SONG Xue-ping,ZHOU Tao-fei,ZHAO Zong-yan,SUN Zhao-qi (Department of Physics,Anhui university,Hefei 230039,China);Effect of Annealing Temperature on the Microstructure and Stress of Al Film[J];Materials Science and Engineering;2003-05
3 LIU Bo, RUAN Hao, GAN Fu xi (Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China);The Characteristics of Al Nano-films Used as Optical Disk Reflective Layer[J];Journal of Optoelectronics.laser;2002-10
4 WANG Feng~(1,2),LI Jun~2,LI Guo-jun~(2,3),WU Wei-dong~(1,2),TANG Yong-jian~2,SUN Wei-guo~1 (1.Institute of Atomic and Molecular Physics,Sichuan University,Chengdu 610065,China;2.Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China;3.Department of Physics,University of Science and Technology of China,Hefei 230026,China);Research on structure and micro-distortion of nano Fe/Al films fabricated by pulse laser deposition[J];High Power Laser & Particle Beams;2005-09
5 ZHANG Miao,WANG Chen,FANG Zhi-heng,WANG Rui-rong,FU Si-zu,GU Yuan,LIN Zun-qi (National Laboratory on High Power Laser Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,P.O.Box 800-211,Shanghai 201800,China);Laser intensity effects on forward hot electrons in interaction with Al foil[J];High Power Laser & Particle Beams;2005-11
6 XIE Jun,HUANG Yan-hua,DU Kai,YUAN Guang-hui(Research Center of Laser Fusion,China Academy of Engineering Physics,P.O.Box 919-987,Mianyang 621900,China);Fabrication process of aluminum film and copper film used in EOS experiment by diamond turning technology[J];High Power Laser and Particle Beams;2006-03
7 Yang Yuxing;Hu Gengxiang;The Study of Thin Film X-ray Stress Analysis[J];JOURNAL OF SHANGHAI JIAOTONG UNIVERSITY;1994-06
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