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Study of Diamond-like Carbon Films Prepared by ECR-RF Dual-Power Source Plasma Chemical Vapor Deposition

SANG Li-jun,CHEN Qiang(Beijing Key Laboratory of Plasma Physical and Material,Beijing Institute of Graphic Communication,Beijing 102600,China)  
Diamond-like carbon films were prepared on Si(100) substrates by a microwave electron cyclotron resonance and ratio frequency power plasma chemical vapor deposition.CH4 and Ar were used as source gas of the carbon and diluted gas respectively.Raman spectra certified the diamond-like carbon characterization of the films;FT-IR spectra indicated that the carbon was bonded with hydrogen participating in bonding.The roughness of the films was checked by atomic force microscope,and the surface RMS of the roughness was approximately 1.489nm,thus,the film surface was very smooth;the frictional properties test was carried out,and the results showed that the average friction coefficient was as low as 0.102.
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