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《Journal of Changchun University of Science and Technology(Natural Science Edition)》 2007-04
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Design and Fabrication of Binary Optical Element Photolithography Mask

SUN Yanjun1,CHEN Yu2,CAO Ziwei1,HE Xianzong1(1.School of photo-electronic engineering,Changchun University of Science and Technology,Changchun 130022;2.School of Electronic information,Changchun University of Science and Technology,Changchun 130022)  
In this paper,we designed binary optical element photolithography mask utilizing phase transfer,with the photolithography characteristic of eight-step binary optical elements in the refractive/diffractive system;We fabricated three different parameter mask utilizing laser direct writing system,researched on the step of fabricating mask,and anaglyzed the error of fabricating mask.
【CateGory Index】: O439
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【References】
Chinese Journal Full-text Database 3 Hits
1 CHENG Xi-min;BAI Yu;XIE Wei-min;XING Ting-wen;LIN Wu-mei;Institute of Optics and Electronics,Chinese Academy of Sciences;University of Chinese Academy of Sciences;Electro-optical Information Institute,University of Electronic Science and Technology of China;;Fabrication Technology and Application in Spectral Lens of Diffractive Optical Elements[J];光电技术应用;2014-02
2 ZHANG Shan,TAN Jiu-bin,WANG Lei,CHENG Tao (Institute of Ultra-precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin 150001,China);Improvement of iterative error-correction method in laser direct writing[J];光学精密工程;2010-02
3 Xie Xudong Zhu Qihua Zhou Kainan Zhang Ying Huang Xiaojun(National Key Laboratory of Plasma Physics,Research Center of Laser Fusion,China Academy ofEngineering Physics,Mianyang,Sichuan 621900,China);Design of Diffractive Optical Elements for Chromatic Aberration Correction in High-Energy Petawatt Laser System[J];光学学报;2010-01
【Citations】
Chinese Journal Full-text Database 2 Hits
1 Wang Duoshu Luo Chongtai Ma Mianjun Liu Hongkai Huang Liangfu (Lanzhou Institute of Physics, Gansu 730000 );Binary mask fabricated by laser direct writing[J];应用激光;2004-04
2 Mi Fengwen,Shen Yibing,Yang Guoguang State Key Laboratory of Modern Optical Instrumentation,Zhejiang University,Hangzhou 310027;A METHOD TO ANALYZE EFFECTS OF DIFFRACTION EFFICIENCY OF DIFFRACTION OPTICAL ELEMENT ON THE PERFORMANCE OF HYBRID OPTICAL SYSTEM[J];光子学报;2000-04
【Co-citations】
Chinese Journal Full-text Database 8 Hits
1 CHENG Xi-min;BAI Yu;XIE Wei-min;XING Ting-wen;LIN Wu-mei;Institute of Optics and Electronics,Chinese Academy of Sciences;University of Chinese Academy of Sciences;Electro-optical Information Institute,University of Electronic Science and Technology of China;;Fabrication Technology and Application in Spectral Lens of Diffractive Optical Elements[J];光电技术应用;2014-02
2 XU Ran-ran YAN Li-hua GONG Yong-qing(Nanchang Hangkong University,Nanchang,Jiangxi 330063,China);Research and Implementation of Lithography Condensate System Based on Chrome Coating Glass[J];南昌航空大学学报(自然科学版);2010-04
3 MA Feng,WANG Duo-shu,LUO Chong-tai,YE Zi-yu,LIU Hong-kai,WANG Ji-zhou(National Key Lab.of Surface Engineering,Lanzhou Institute of Physics,Lanzhou 730000,China);PREPARATION AND OPTICAL PROPERTY OF BIMETALLIC THIN FILMS FOR LASER DIRECT-WRITE GRAY-LEVEL MASK[J];真空与低温;2009-01
4 WANG Duo-shu,LUO Chong-tai,CHEN Tao,LIU Hong-kai,YE Zi-yu(Key Lab of Surface Engineering,Lanzhou Institute of Physics,Lanzhou 730000,China);Laser power characterization method for fabrication of centrosymmetric CR-DOEs mask by polar laser direct writing[J];光学技术;2009-01
5 MA Tao1,2,SHEN Yi-bing2,YANG Guo-guang2(1.Key Laboratory of Modem Optical Technology of Jiangsu Province,Soochow University,Suzhou 215006,China; 2.State Key Laboratory of Modern Optical Instrumentation,Zhejiang University,Hangzhou 310027,China);Improving diffraction efficiency of DOE in wide waveband application by multilayer micro-structure[J];红外与激光工程;2008-01
6 SUN Yanjun1,CHEN Yu2,CAO Ziwei1,HE Xianzong1(1.School of photo-electronic engineering,Changchun University of Science and Technology,Changchun 130022;2.School of Electronic information,Changchun University of Science and Technology,Changchun 130022);Design and Fabrication of Binary Optical Element Photolithography Mask[J];长春理工大学学报(自然科学版);2007-04
7 XIA Hao-jie1,FEI Ye-tai1,WANG Zhong-yu2 (1 School of Instrumentation Science and Photoelectricity Engineering,Hefei University of Technology, Hefei 23009,China) (2 School of Instrumentation Science and Photoelectricity Engineering,Beihang University, Beijing 100083,China);The 2-D Grating′s Spectrum Analysis and Application in Precise Measurement[J];光子学报;2007-04
8 MI Feng-wen1,YANG Guo-guang2,SHENG Yi-bing2 (1.Dept. of Optical Engineering, School of Information Technology, Beijing Institute of Technology, Beijing 100081, China; 2. Zhejiang University, State Key Laboratory of Modern Optical Instrumentation, Zhejiang Hangzhou 310027, China);A Measurement of Optical Transfer Function of Infrared Hybrid Optical System and Its Realization[J];红外技术;2005-03
【Co-references】
Chinese Journal Full-text Database 10 Hits
1 GONG Yan,ZHAO Lei (State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics, Chinese Academy of Sciences,Changchun 130033,China);Single point diamond machines and their applications to optical engineering[J];中国光学;2011-06
2 ZHANG Wei1,LI Yi1,2,ZHANG Hu1,HUANG Yi-ze1,ZHU Hui-qun3,SUN Ruo-xi1(1.School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China;2.Shanghai Key Laboratory of Modern Optical System,University of Shanghai for Science and Technology,Shanghai 200093,China;3.Institute of Thin Films and Nanomaterials,Wuyi University,Jiangmen 529020,China);Ultraviolet diffractive microlens array design and fabrication[J];上海理工大学学报;2011-02
3 Liang Xu1 Wang Junhua2 Xu Min1 Li Jinjiang2 Li Xufeng2(1Key Laboratory of Micro and Nano Photonic Structure,Ministry of Education,Department of Optical Science and Engineering,Fudan University,Shanghai 200433,China 2Shanghai Modern Advanced Ultra Precision Manufacturing Center.Ltd.,Shanghai 200438,China);Single-Point Diamond Turning and Testing of Hybrid Diffractive-Refractive Optical Lens[J];激光与光电子学进展;2011-03
4 Yan Peipei1,2 Fan Xuewu1 Zou Gangyi1 He Jianwei1,2 1Space Optics Laboratory,Xi'an Institute of Optics and Precision Mechanics,Chinese Academyof Sciences,Xi'an,Shaanxi 710119,China2Graduate University of Chinese Academy of Sciences,Beijing 100049,China;Design of Hybrid Refractive-Diffractive Apochromatic Telephoto Lens Used in Visible Spectra[J];激光与光电子学进展;2010-09
5 KANG Zhan,NIE Feng-ming,LIU Jing-song,ZHANG Guang-ping(Office of Research on Ultraprecise Machining Technology,China Weaponry Industry No.55 Research Institute,Changchun 130012,Jilin,China);Research on single point diamond precision numerical control turning technique and its development[J];光学技术;2010-02
6 BAI Jian1, WEI Zhi-jun2, NIU Shuang1, HOU Xi-yun1, XU Jian-feng1(1.State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;2.Institute of No.502,China Areaspace Science & Technology Corporation, Beijing 100190, China);Spherical lens with binary optical element for visible and UV dual-band optical system[J];红外与激光工程;2009-06
7 MA Feng,WANG Duo-shu,LUO Chong-tai,YE Zi-yu,LIU Hong-kai,WANG Ji-zhou(National Key Lab.of Surface Engineering,Lanzhou Institute of Physics,Lanzhou 730000,China);PREPARATION AND OPTICAL PROPERTY OF BIMETALLIC THIN FILMS FOR LASER DIRECT-WRITE GRAY-LEVEL MASK[J];真空与低温;2009-01
8 WANG Duo-shu,LUO Chong-tai,CHEN Tao,LIU Hong-kai,YE Zi-yu(Key Lab of Surface Engineering,Lanzhou Institute of Physics,Lanzhou 730000,China);Laser power characterization method for fabrication of centrosymmetric CR-DOEs mask by polar laser direct writing[J];光学技术;2009-01
9 JIN Zhan-lei,TAN Jiu-bin,ZHANG Shan,WANG Lei,LYun-fei(Institute of Ultra-precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin 150001,China);Optimization of S-curve intensity control model for laser direct writing[J];光学精密工程;2008-04
10 SUN Yanjun1,CHEN Yu2,CAO Ziwei1,HE Xianzong1(1.School of photo-electronic engineering,Changchun University of Science and Technology,Changchun 130022;2.School of Electronic information,Changchun University of Science and Technology,Changchun 130022);Design and Fabrication of Binary Optical Element Photolithography Mask[J];长春理工大学学报(自然科学版);2007-04
【Secondary References】
Chinese Journal Full-text Database 1 Hits
1 HUO Lei,ZENG Xiao-dong(Institute of Technical Physics,Xidian University,Xi′an 710071,China);Non-uniform sound field distribution of acousto-optic device in laser heterodyne interferometry[J];光学精密工程;2011-10
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