Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Materials Review》 2002-09
Add to Favorite Get Latest Update

Advances in Research on Deposition Techniques for ZnO Thin Films

WANG Lei (State Key Laboratory of Silicon Material,Zhejiang University,Hangzhou 310027,China)  
Zinc oxide is a novel material for Ⅱ-Ⅵ semiconductor.A number of deposition techniques for ZnO thin films are now available,such as magnetron sputtering,spray pyrolysis,molecular beam epitaxy,pulsed laser deposition,metal-organic chemical vapor deposition and some novel growth technologies,including sol-gel,atomic layer epitaxy,chemical bath deposition,ion beam assisted deposition,successive ion layer adsorption and reactions,film oxidation,and so on.In this work,advances in research on deposition techniques for ZnO thin films are reviewed in detail.
【Fund】: 国家重大基础研究项目基金(编号No.G20000683-06)
【CateGory Index】: TB43
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved