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《Materials Review》 2005-01
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Optical Properties of ITO Films Prepared by RF Magnetron Sputtering at Room Temperature

LI Shitao QIAO Xueliang CHEN Jianguo (State Key Lab of Die & Mould Technology,Huazhong University of Science and Technology,Wuhan 430074)  
By using magnetron sputtering method,highly transparent and conductive ITO films can be de- posited on glass substrate at room temperature with indiumtin oxide(In_2O_3:SnO_2=1:1)target.Ar gas pressure (P_(Ar))is 0.2~3.0Pa and oxygen flux(fo_(1/2))is 0~10sccm under the control of gas mass flowmeter.In this paper,the effects of P_(Ar) and fo_2 on the ITO films are discussed in detail.It is concluded that refractive index is minimal,n=1.97 which approaches the optical matching,when P_(Ar)=0.8Pa and fo_2=2.4sccm.In visible light spectrum,the maximal transmittance of ITO film is 89.4% the square resistance Rs=75.9Ω/□,the conductance σ=8.8×10~(-4)Ω·cm when the thickness of ITO film is 241.5nm.
【Fund】: 国防预研跨行业基金项目(51410020401JW0504)
【CateGory Index】: TB383.2
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