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《Journal of Materials Science and Engineering》 2004-05
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Preparation and Characterization of CN_x Films by Electrochemical Deposition

CHEN Gang, YAN Xing-bin, LIU Hui-wen, XU Tao (State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China)  
Carbon nitride films were deposited on Si(100) substrates by electrolysis of methanol-urea solution. The morphology and microstructure of the CN x films were analyzed by means of atomic force microscopy(AFM), Raman spectroscopy, X-ray spectroscopy(XPS), Fourier transformation infrared spectrometry(FITR) and X-ray diffraction(XRD). As the results, the CN x films are compact, with biggish surface roughness; Raman spectrum indicated that the film was amorphous; XPS and FTIR measurements suggested the existence of both single and double carbon-nitride bonds in the film; XRD spectrum confirmed the existence of β-C 3N 4 polycrystalline phases.
【Fund】: 国家自然科学基金资助项目 (50 1 72 0 52 ) (50 2 71 0 80 );; 中科院百人计划资助项目
【CateGory Index】: TB43
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