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《MATERIALS SCIENCE AND ENGINEERING》 1998-02
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Influence of RF Sputtering Condition on ZnO Transparent Conducting Film.

Ni Xingyuan\ Wu Yonggang\ Wu Guangming\ Zhou Zen Zhang Huiqin\ Jin ZheminTongji University\ Shanghai\ 200092  
ZnO Film have been found wide application. ZnO transparent conducting film has been prepared by RF planar magnetron sputtering. The dependence of electrical and optical characteristics upon target material, sputtering gas and substrate temperature has been investigated. The resistivity of film is 4.5×10-3cm, carrier concentration and Hall mobility are 2.3×10.19cm-3 and 5.99 cm2/v. sec respectively. The optical transmission is about 85%.
【CateGory Index】: TQ132.41
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10 Ni Xingyuan\ Wu Yonggang\ Wu Guangming\ Zhou Zen Zhang Huiqin\ Jin ZheminTongji University\ Shanghai\ 200092;Influence of RF Sputtering Condition on ZnO Transparent Conducting Film.[J];材料科学与工程;1998-02
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