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《Chinese Journal of Materials Research》 2003-02
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Fabrication and characterization of nanoporous silica film

YIN Mingzhi YAO Xi WU Xiaoqing (Electronic Materials Research Laboratory, Xi'an Jiaotong University 710049 China) To whom correspondence should be addressed, Tel:(029)2668679  
Crack-free homogeneous nanoporous silica films were prepared with colloidal silica sol derived by sol-gel process of tetraethylorthosilicate (TEOS) catalyzed with R4N+OH-. The solution with ratio of H2O/TEOS25, R4N+ and glycerol were combined with the intermediate Si(OR)4-x;(OH)x and SixOy(OH)z+nr avoiding aggregation of the nanosilica particles, presence of the poly(vinyl alcohol) (PVA) made colloidal silica sol a polymeric structure (filming easily). The silica films have heterostructure, which can avoid crack of the nanoporous silica films during being annealed. The homogeneous nanoporous silica films can develop due to accumulated structure of silica particle within films during annealing. The pore sizes distribute between 100-200 nm after annealed at 850 ℃ for 30 min. The refractive indexes were 1.27-1.42, the dielectric constant was 1.4-2, the thermal conductivity was 0.2 W/m.K.
【Fund】: 国家重点发展规划(973)资助项目 No.2002CB613305
【CateGory Index】: TB43
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