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Theory and Applications of Atomic Layer Deposition

WU Yi-yong, LI Bang-sheng, WANG Chun-qing(Harbin Institute of Technology, Harbin 150001, China)  
Conventional techniques such as PVD and CVD are not suitable for the future manufactory of the micro-devices due to that they cannot deposit such films. A new technology of atomic layer deposition would become one of solutions for the future ultra-thin materials because of its precisely digital control in the film thickness (to angstrom scale) and compositions, excellent uniformality and conformance. This paper reviews the theory, application and the corresponding equipments for atomiclayerdepositionprocess.
【CateGory Index】: TN304.05
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Chinese Journal Full-text Database 2 Hits
1 WANG Zhiyu,JIAO Gangcheng,FAN Huiqing(State Key Laboratory of Solidification Processing,School of Materials Science and Engineering,Northwestern Polytechnical University,Xi’an 710072);Principle and Application of Ferroelectric Films by Atomic Layer Deposition[J];Materials Review;2007-S1
2 He Junpeng,Zhang Yueguang*,Shen Weidong,Liu Xu,Gu Peifu (State Key Laboratory of Modern Optical Instrumentation,Zhejiang University,Hangzhou 310027,China);Atomic Layer Deposition and Its Applications in Optical Thin Films[J];Chinese Journal of Vacuum Science and Technology;2009-02
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1 XIAO Dingquan(Department of Materials Science , Sichuan University, Chengdu 610064, China);Investigation on some important aspects in ferroelectric thin film researches[J];Journal of Functional Materials;2003-05
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3 LU Hong-Liang, XU Min, DING Shi-Jin, REN Jie, ZHANG Wei (Department of Microelectronics, ASIC and System State Key laboratory, Fudan University, Shanghai 200433, China);Thermal Stability of Atomic Layer Deposition Al_2O_3 Thin Films[J];Journal of Inorganic Materials;2006-05
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【Secondary References】
Chinese Journal Full-text Database 1 Hits
1 He Junpeng Zhang Yueguang Shen Weidong Liu Xu Gu Peifu(State Key Laboratory of Modern Optical Instrumentation,Zhejiang University,Hangzhou,Zhejiang 310027,China);Optical Properties of Al_2O_3 Thin Film Fabricated by Atomic Layer Deposition[J];Acta Optica Sinica;2010-01
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