Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Equipment for Electronic Products Manufacturing》 2006-10
Add to Favorite Get Latest Update

The Test Bench for Wafer Focusing and Leveling Sensor

JIN Xiao-bing1, LI Xiao-ping1, CHEN Fei-biao1, LI Zhi-dan2, XIAO Ke-yun2(1. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, Hubei, 430074, China2. Shanghai Micro Electronics Equipment Co.,Ltd, Shanghai, 201203, China)  
The Test Bench built for Wafer Focusing and Leveling Sensor is to measure and evaluate its performance. The test bench can simulate the wafer movement and working condition inside the lithography tool. A high precision stage with 3 axes simulates the exposure chuck to drive wafer to move along z, θx and θy direction. The sensor performance is decided by comparing the results measured by the sensor and laser interferometer. The test bench can be used to evaluate the accuracy, resolution and repeatability of the sensor with its high performance.
【CateGory Index】: TN307
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
【References】
Chinese Journal Full-text Database 1 Hits
1 RAN Zuo,ZHOU Jin-yun,LEI Liang,ZHOU Ya-mei,DENG Ya-fei (1.School of Physics&Optoelectronic Engineering,Guangdong University of Technology,Guangzhou 510006,China);A new zooming method for projection imaging lithography[J];Journal of Applied Optics;2013-03
【Citations】
Chinese Journal Full-text Database 2 Hits
1 ZENG Aijun WANG Xiangzhao XU Deyan(Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai201800);Progress in Focus and Level Sensor for Projection Lithography System[J];Laser & Optronics Progress;2004-07
2 CHEN Xu-nan,LUO Xian-gang,LIN Wu-mei,YU Guo-bin (State Key Lab of Optical Technology on Microfabrication,Institute of Optics and electrons,Academia Sinica.Chengdu 610209,China);Design of 193nm Projection lithography lens[J];Microfabrication Technology;2001-02
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 YIN Zuo-hai,LIU Shi-yuan,SHI Tie-lin (School of Mechanical Science & Engineering,Huazhong University of Science and Technology,WuhanNational Lab.for Optoelectronics,Wuhan 430074,China);Research on Focus and Level System for Stepper Based on Linear Array CCD[J];Semiconductor Technology;2007-01
2 Li Jinlong1,2,Zhao Lixin1,Hu Song1,Zhou Shaolin1,2(1.Institute of Optics & Electronics,Chinese Academy of Sciences,Chengdu 610209,China;2.Graduate School of Chinese Academy of Sciences,Beijing 100039,China);Focusing and Leveling in Dual-Stage Lithographic Systems[J];Micronanoelectronic Technology;2010-08
3 Liu Juan~(1,2),Zhang Jin~1,and Feng Boru~1(1 State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China)(2 Graduate School of Chinese Academy of Science,Beijing 100039,China);Comparison Between Imaging Interferometric Lithography and Off-Axis Illumination Lithography[J];Chinese Journal of Semiconductors;2005-07
4 He Le1,2 Wang Xiangzhao1 Wang Fan1 Shi Weijie1 Ma Mingying1,21 Laboratory of Information Optics,Shanghai Institute of Optics and Fine Mechanics, the Chinese Academy of Sciences,Shanghai 2018002 Graduate University of Chinese Academy of Sciences,Beijing 100039;Novel in-Situ Non-Flatness Measurement Method of Wafer Chuck in Step-and-Scan Lithographic Tool[J];Acta Optica Sinica;2007-07
5 Li Xiaoping Chen Feibiao(State Key Laboratory of Digital Manufacturing Equipment and Technology,Huazhong University of Science and Technology,Wuhan 430074);Measurement Model of Focusing and Leveling Measurement System for Projection Lithography Tool[J];Acta Optica Sinica;2007-11
6 Li Jinlong 1,2 Hu Song 1 Zhao Lixin 1 1 Institute of Optics and Electronics,Chinese Academy of Science,Chengdu,Sichuan610209,China 2 University of Chinese Academy of Sciences,Beijing100049,China;Control Technique of Wafer Surface in Dual-Stage Lithographic System[J];Acta Optica Sinica;2012-12
7 HU Jian-ming~(1,3),ZENG Ai-jun~(1,2),WANG Xiang-zhao~1 ~1Information Optics Laboratory,Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800,China ~2Shanghai Hengyi Optics & Fine Mechanics Co.,Ltd,Shanghai 201800,China ~3Graduate School of the Chinese Academy of Sciences,Beijing 100039,China;Polarization Modulation Technology for a Position Sensor with Grating Imaging[J];Chinese Journal of Lasers;2006-10
8 CHEN Fei-biao,LI Xiao-ping(College of Mechanical Science and Engineering of HuazhongUniversity of Science and Technology,Wuhan 430074,China);Model of Silicon Wafer Topography for Focusing and Leveling Measurement System[J];Microfabrication Technology;2006-03
9 He Haidong,Yang Haifeng (College of Mechanical & Electrical Engineering,China University of Mining and Technology,Xuzhou 221008,Jiangsu,China);Technologies and applications of laser interference lithography[J];Modern Manufacturing Engineering;2012-06
10 GONG Yan,ZHANG Wei (State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China);Present status and progress in 193 nm exposure system in lithography[J];Chinese Journal of Optics and Applied Optics;2008-Z1
【Co-references】
Chinese Journal Full-text Database 10 Hits
1 LI Wen-jing,ZHOU Jin-yun,LIN Qing-hua ( College of Physics and Photoelectricity Engineering, Guangdong University of Technology, Guangzhou 510006, China );Design of fold laser projection lithography lens[J];Opto-Electronic Engineering;2007-09
2 ZHANG Wei-guo1, 2,DONG Xiao-chun1,DU Chun-lei1 ( 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; 2. Graduate University of Chinese Academy of Science, Beijing 100039, China );Zooming Method for Microlens Array Imaging Photolithography[J];Opto-Electronic Engineering;2010-03
3 GUO Huan-qing~(1**), WANG Zhao-qi~1, WANG Jin-cheng~2, LANG Hai-tao~2(1.Institute of Modern Optics,Nankai University,Tianjin 300071,China; 2.Physics Department of Chinese Ocean University,Shangdong 266071,China);Research of the DMD in a Digital Synthetic Holography System[J];Journal of Optoelectronics.laser;2004-01
4 YU Qiu-xiang,YI Yun(1.Jiangxi Vocational College of Applied Technology,Ganzhou 341000,China;2.Gannan Normal University,Ganzhou 341000,China);Double-light-source DMD Digital Lithography System[J];OME Information;2011-08
5 PEI Wen-yan1,ZHOU Jin-yun2,LIANG Guo-jun2,Lin Qing-hua2(1.Experimental Teaching Center,Guangdong University of Technology,Guangzhou 510006,China)(2.School of Physics & Optoelectronic Engineering,Guangdong University of Technology,Guangzhou 510006,China);Design of laser beam uniformity based on light-guide wall in seamless scanning lithography[J];Optical Technique;2009-04
6 Chen Xunan Yao Hanmin (Institute of Optics & Electronics, Chinese A cademy of Science, Chengdu,610209);Design and development of lithography lens in 0.7μm i line projection exposure system[J];OPTICAL TECHNOLOGY;1998-03
7 Wu Fan Yang Li Chen Qiang Wu Shibin Xu Quanyi Zhang Jing (Institute of Optics and Electronics, Chinese Academy of Science, Cheugde 610209);Optical fabrication technology of sub micro lithography lens[J];OPTICAL TECHNOLOGY;1998-03
8 Li Xiaoping Chen Feibiao(State Key Laboratory of Digital Manufacturing Equipment and Technology,Huazhong University of Science and Technology,Wuhan 430074);Measurement Model of Focusing and Leveling Measurement System for Projection Lithography Tool[J];Acta Optica Sinica;2007-11
9 Guo Xiaowei~(1,2) Du Jinglei~1 Liu Yongzhi~11 School of Optoelectronic Information, University of Electronic Science and Technology,Chengdu, Sichuan 610054, China2 Physics Department, Sichuan University, Chengdu, Sichuan 610064, China;Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography[J];Acta Optica Sinica;2009-03
10 Ma Tao,Shen YibingZhejiang Univercity State Key Laboratory of Optical Instrument, Hangzhou 310027;Distortion Detect of Large Field Projection Lithography Lens[J];Acta Photonica Sinica;2005-01
【Secondary Citations】
Chinese Journal Full-text Database 10 Hits
1 FENG Bo-ru 1 ,ZHANG Jin 1,2 ,ZONG De-rong 1 ,JIANG Shi-lei 1 ,SU Ping 1,2 ,CHEN Bao-qin 3 ,CHEN Fen 4(1.State Key Lab of Optical Technologies for Microfabrication,Institute of Optics&Electronics,Chinese Academy of S;Study of interferometric lithography without masks[J];Semiconductor Information;2002-03
2 WENG Shou song(Huajing Group WuXi №4 Radio Component Factory, WuXi 214002, China);The Moore's Law and Semiconductor Equipment[J];Equipment For Electronic Products Manufacturing;2002-04
3 Hu Song,Yao Hanmin,Zhang Jin, L i Zhan,Zeng Xiaoyang,Su Weijun (Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu,6 1 0 2 0 9);Field-by-Field Leveling Techniques and Overlapping Stepping Model for0 .35μm Projection Stepper[J];OPTO-ELECTRONIC ENGINEERING;1998-S1
4 FENG Bo ru, ZHANG Jin, HOU De sheng ZHOU Chong xi, CHEN Fen (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209,China);Optical Microlithography with Attenuated Phase Shifting Mask[J];OPTO-ELECTRONIC ENGINEERING;1999-05
5 FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of;Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction[J];Opto-electronic Engineering;2001-01
6 KANG Xi qiao, LUO Xian gang, CHEN Xu nan (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optical and Electronics,Chinese Academy of Sciences,Chengdu 610209,China);A Study on Improving Imaging Resolution of Projection Photolithography with Pupil Filtering[J];Opto-electronic Engineering;2001-03
7 ZHANG Jin1,2, FENG Bo-ru2, GUO Yong-kang1, JIANG Shi-lei2, ZONG De-rong2, DU Jing-lei1, ZENG Yang-su1, GAO Fu-hua1 (1. Department of Physics, Sichuan University, Chengdu 610064, China; 2. State Key Laboratory of Optical Technologies for Microfabrication,;Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area[J];Opto-electronic Engineering;2001-06
8 FENG Bo-ru1, ZHANG Jin1,2, ZONG De-yong1, JIANG Shi-lei1 (1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; 2. Department of Physics, Sichuan University, Chengdu 610054, China);A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers[J];Opto-electronic Engineering;2003-01
9 Luo Xiangang, Chen Xunan,Yao Hanmin, Feng Boru (State Key Laboratory of Optical Technology for Microfabrication,Institute of Optics & Electronics, Chinese Academy of Sciences,Chengdu,610209);The Study on Binary Grating Illumination[J];OPTO-ELECTRONIC ENGINEERING;1998-06
10 Wu Fan Yang Li Chen Qiang Wu Shibin Xu Quanyi Zhang Jing (Institute of Optics and Electronics, Chinese Academy of Science, Cheugde 610209);Optical fabrication technology of sub micro lithography lens[J];OPTICAL TECHNOLOGY;1998-03
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved