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《Equipment for Electronic Products Manufacturing》 2011-01
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The Pneumatic Booster Pump Apply to the Single Wafer Cleaning Process

DU Jianke,LIU Yongjin,FENG Xiaoqiang (The 45th Research Institute of CETC,Beijing 101601,Chia)  
This article analyses the pneumatic booster pump's configuration and working principle,introduced its applying characteristic and advantage in the single wafer cleaning process.In addition,this article expounds the controlling and choosing ways and means when applying the pneumatic booster pump.
【CateGory Index】: TN305.2
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