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《Electronic Components and Materials》 2009-06
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Effect of technological conditions on the electrical and optical properties of flexible ITO films

XIN Rongsheng1,LIN Yu 2,JIA Xiaolin 1 (1.College of Material Science and Engineering,Zhengzhou University,Zhengzhou 450052,China;2.Department of Chemistry,Henan Education Institute,Zhengzhou 450014,China)  
ITO transparent conductive thin films were deposited on flexible substrates using DC magnetron sputtering method.The effects of technological conditions(such as the film thickness,the oxygen flux,the sputtering speed,the sputtering pressure and the temperature etc.) on the electrical and optical properties of ITO films were studied comprehensively.The results show that an optimum condition to prepare ITO films can be obtained,in which the film thickness is above 80 nm,the ratio of O2 to Ar is 1:40,the sputtering speed is 5 nm/min,the sputtering pressure is about 0.5 Pa and the temperature is in a range of 80~160 ℃.ITO thin films prepared under the optimum condition exhibit better electrical and optical properties,with resistivity below 5×10–4 ?·cm and visible light transmissivity beyond 80%.
【Fund】: 河南省科技攻关项目(No.0224380029)
【CateGory Index】: TB383.2
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