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《Electronics Process Technology》 2009-05
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Nanoimprint Technology and Applications

LUO Kang,DUAN Zhi-yong(Zhengzhou University,Zhengzhou 450001,China)  
Transfer of graphics is achived by oplical lithography for several decades in semiconductor process.The prodution capacity of 45 nm node has been formed.But now semiconductor industry is difficult to be developed according to Moore law because of the inherent limitations of oplical lithograhy.Now electron-beam direct writing,X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology.Nanoimprint technology has the advantages of high yield,low cost and simple process.Introduce the traditional nanoimprint technology and its development,including hot embossing lithography technology,ultraviloet nanoimprint,micro-contact nanoimprint,pressure-assited nanoimprint,laser-assisted nanoimprint,electrostatic-assisted nanoimprint,ultrasound-assisted nanoimprint and roller-type nanoimprint technolgoy.
【Fund】: 河南省教育厅自然科学基金项目(项目编号:NO.2009A140008)
【CateGory Index】: TN305.7
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【References】
Chinese Journal Full-text Database 1 Hits
1 DUAN Zhi-yong,LUO Kang (Zhengzhou University,Zhengzhou 450001,China);Electromagnet-assisted Nanoimprint Technology[J];Electronics Process Technology;2010-03
【Citations】
Chinese Journal Full-text Database 1 Hits
1 SUN Hong-wen1,LIU Jing-quan2,CHEN Di2(1.Hehai University,Changzhou 213022,China;2.Shanghai Jiaotong University,Shanghai 200030,China);Research on Micro/nanopattern Fabrication based on Nanoimprint Lithography at Low Temperature[J];Electronics Process Technology;2008-06
【Co-citations】
Chinese Journal Full-text Database 1 Hits
1 DUAN Zhi-yong,LUO Kang (Zhengzhou University,Zhengzhou 450001,China);Electromagnet-assisted Nanoimprint Technology[J];Electronics Process Technology;2010-03
【Co-references】
Chinese Journal Full-text Database 1 Hits
1 SUN Hong-wen1,LIU Jing-quan2,CHEN Di2(1.Hehai University,Changzhou 213022,China;2.Shanghai Jiaotong University,Shanghai 200030,China);Research on Micro/nanopattern Fabrication based on Nanoimprint Lithography at Low Temperature[J];Electronics Process Technology;2008-06
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