Depositing Nanoscale Conductive Layer on Non-Woven Substrate for Developing Electronic Textiles
XIAO Ju-xia,WEI Qu-fu(Key Laboratory of Eco-textiles, Ministry of Education,Jiangnan University, WuXi, JiangSu, 214122, China)
The aim of this work is to develop a new technique to develop electronic textiles, that is, depositing conductive layer on the surface of non-woven fabrics at room temperature by DC magnetron sputtering process. This new technique got ride of such shortcomings of traditional electronic textiles as complicated processing and water pollution.The electricity properties and surface structures of the electronic functional layer on the non-woven substrate.were analyzed. The relations between the micro-structure of the electronic functional layers (Al, Cu and Ag) the electricity properties were also discussed. The structures and surface conductivity of the sputter coated substrates were examined by atomic force microscopy and conductivity measurements. This technique of developing flexible circuit board will open up new possibility for the development of smart textile products. Smart textiles have great potential for a wide range of applications.
【CateGory Index】： TS106