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《Acta Electronica Sinica》 2002-11
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Study of Silicon-Based MEMS Technology and Its Standard Process

WANG Yang yuan,WU Guo ying,HAO Yi long,ZHANG Da cheng, XIAO Zhi xiong,LI Ting,ZHANG Guo bing,ZHANG Jin wen(Institute of Microelectronics,Peking University,Beijing 100871,China)  
In this paper the four sets of standard processes developed by Institute of microelectronics of Peking University are presented.In these four sets of standard process,three of them are bulk micromachining processes and one is surface sacrificial process.The key technologies used in these processes were studied systematically.Research work included:systematically study how to control the stress of polysilicon film;developed two anti stiction technologies;research of Si/Si bonding,Si/Ni/Si bonding and Si/Glass bonding;study and optimization of high aspect ratio silicon etching;successfully reducing RIE Lag from 23% to 5%;exploiting two kinds of multi step silicon etching technologies.
【Fund】: 国家重大基础研究项目 (973) (No G1 9990 331 0 9 G1 9990 331 0 8)
【CateGory Index】: TH706
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