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《Acta Electronica Sinica》 2007-02
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A Method for In-Situ Measuring Average Stress Gradient and Elastic Modulus of a MEMS Film

RONG Hua~1,2,HUANG Qing-an~2,WANG Ming~1(1.Jiangsu Province Key Laboratory of Optoelectronic Technology,Nanjing Normal University,Nanjing,Jiangsu 210097,China;2.Key Laboratory of MEMS of Education Ministry,Southeast University,Nanjing,Jiangsu 210096,China)  
An electrostatically actuated in-situ measuring method for average stress gradient and elastic modulus of a MEMS film was proposed based on pull-in voltages of a set of cantilevers.The key of the measuring method is to realize rapid and accurate calculation of pull-in voltages of the cantilevers.To increase the accuracy of the measurement,bending of the cantilevers along the width direction due to the stress gradient was considered.Actual simulations indicate that the calculating speed and the accuracy of the measuring method are ideal,and the method can apply to in-situ measurement.
【Fund】: 江苏省自然科学基金(No.BK2006223)
【CateGory Index】: O484.4
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