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《Opto-electronic Engineering》 2004-01
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Phase-shifting mask for 100nm node ArF excimer laser lithography

FENG Bo-ru1, ZHANG Jin1, ZONG De-rong1, LIU Juan1, CHEN Bao-qin2, LIU Ming2 ( 1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China ; 2. Microelectronics R & D Center, Chinese Academy of Sciences, Beijing 100029, China )  
Phase-Shifting Mask (PSM) techniques used in 100nm node ArF excimer laser lithography primarily are chromeless PSM, alternating PSM, attenuated PSM and hybrid PSM. The basic principles, fabrication methods and performance comparison for these masks are analyzed and studied. The research shows that the hybrid mask consisting of chromeless PSM and attenuated PSM with high transmittance is most suitable for creating 100nm node resist patterns in 193nm ArF lithography.
【Fund】: 国家自然科学基金资助项目 ( 60276043);; 中国科学院光电技术研究所微细加工光学技术国家重点实验室基金资助课题
【CateGory Index】: TN305.7
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【Citations】
Chinese Journal Full-text Database 2 Hits
1 Feng Boru, Sun Guoliang, Shen Feng, Que Long (State Key Laboratory of Optical Technology for Microfabrication,Institute of Optics & Electronics, Chinese Academy of Sciences,Chengdu,610209) Chen Baoqin (Microelectronics Center,Chinese Academy of Scie;Optical Microlithographic Phase-Shifting Mask Technology[J];Opto-electronic Engineering;1996-S1
2 FENG Bo ru, ZHANG Jin, HOU De sheng ZHOU Chong xi, CHEN Fen (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209,China);Optical Microlithography with Attenuated Phase Shifting Mask[J];OPTO-ELECTRONIC ENGINEERING;1999-05
【Co-citations】
Chinese Journal Full-text Database 2 Hits
1 ZHAO Wei1, 2, CHENG Xiu-lan1 (1.Shanghai Jiao Tong University, Shanghai 200030,China;2.Semiconductor Manufacturing International Corporation., Shanghai 201200,China);The Relationship Between Resist and Pre-layer Pattern Research for the Effect of Yield in PSM Process[J];Electronics & Packaging;2008-10
2 FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of;Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction[J];Opto-electronic Engineering;2001-01
【Co-references】
Chinese Journal Full-text Database 10 Hits
1 WENG Shou-song (Wuxi Luo Te Electronic Co.,LTD,Wuxi214002,China);90nm process and its relevant technology[J];Semiconductor Information;2003-04
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