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《Opto-electronic Engineering》 2004-01
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Phase-shifting mask for 100nm node ArF excimer laser lithography

FENG Bo-ru1, ZHANG Jin1, ZONG De-rong1, LIU Juan1, CHEN Bao-qin2, LIU Ming2 ( 1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China ; 2. Microelectronics R & D Center, Chinese Academy of Sciences, Beijing 100029, China )  
Phase-Shifting Mask (PSM) techniques used in 100nm node ArF excimer laser lithography primarily are chromeless PSM, alternating PSM, attenuated PSM and hybrid PSM. The basic principles, fabrication methods and performance comparison for these masks are analyzed and studied. The research shows that the hybrid mask consisting of chromeless PSM and attenuated PSM with high transmittance is most suitable for creating 100nm node resist patterns in 193nm ArF lithography.
【Fund】: 国家自然科学基金资助项目 ( 60276043);; 中国科学院光电技术研究所微细加工光学技术国家重点实验室基金资助课题
【CateGory Index】: TN305.7
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Chinese Journal Full-text Database 2 Hits
1 Feng Boru, Sun Guoliang, Shen Feng, Que Long (State Key Laboratory of Optical Technology for Microfabrication,Institute of Optics & Electronics, Chinese Academy of Sciences,Chengdu,610209) Chen Baoqin (Microelectronics Center,Chinese Academy of Scie;Optical Microlithographic Phase-Shifting Mask Technology[J];Opto-electronic Engineering;1996-S1
2 FENG Bo ru, ZHANG Jin, HOU De sheng ZHOU Chong xi, CHEN Fen (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209,China);Optical Microlithography with Attenuated Phase Shifting Mask[J];OPTO-ELECTRONIC ENGINEERING;1999-05
Chinese Journal Full-text Database 2 Hits
1 ZHAO Wei1, 2, CHENG Xiu-lan1 (1.Shanghai Jiao Tong University, Shanghai 200030,China;2.Semiconductor Manufacturing International Corporation., Shanghai 201200,China);The Relationship Between Resist and Pre-layer Pattern Research for the Effect of Yield in PSM Process[J];Electronics & Packaging;2008-10
2 FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of;Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction[J];Opto-electronic Engineering;2001-01
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2 LI Yan qiu (Micro & Nano Fabrication Devision,Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100080,China);The status and tendency of next generation lithography[J];Micronanoelectronic Technology;2003-Z1
3 LI Hong1,2, ZHOU Yunfei1 (1.National Engineering Research Center of NC System Technology,Huazhong University of Science & Technology,Wuhan 430074,China; 2.Dept. of Electric Power Engineering,Changsha University of Electric Power,Changsha 410077,China);Application of Predictive Feedforward Compensation Control to Long Stroke Motor in Scanning Wafer Stage of Lithography[J];Journal of Changsha University of Electric Power(Natural Science);2003-03
4 XIE Chang?qing (The 3rd lab of Microelectronics R&D Center,Chinese Academy of Sciences,Beijing 100010,China)[FK(W82。36ZQ];The Fabrication Technology for Deep?Sub?Micron Optical Lithography Tool[J];EQUIPMENT FOR ELECTRONIC PRODUCTS MANUFACTURING;2000-02
5 LUO Zheng-quan(Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China);The Design of Control System for Submicron Wafer Stepper[J];Equipment For Electronic Products Manufacturing;2000-04
6 WEN Shang-ming; YUAN Da-fa; TANG Yong; SUN Qiu-yan; BAI De-kai(Institute of Optics and Electronics, ChineseAcademy of Sciences, Chengdu 610209, China);Prospect of the Next Generation Lithography[J];OPTO-ELECTRONIC ENGINEERING;1999-S1
7 Tian Hong (Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu,610209);Computer Software used in Control and Management of Wafer Stepper[J];OPTO-ELECTRONIC ENGINEERING;1998-03
8 TANG Jiu yao, CAO Xiang qun, CHEN Yu qing (National Research Center of Engineering and Technology for Optical Instrumentation,Zhejiang University,Hangzhou 310027,China);Research on the Resolution and Alignment Limit of a Mask Aligner[J];Journal of Optoelectronics.laser;2001-11
9 ;Development of 100nm step-scanning projection photographic machine[J];Optics Mechanics & Electronics Information;2004-05
10 GUO Li-ping,HUANG Hui-jie,WANG Xiang-zhao(Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China);Exposure dose control for step-and-scan lithography[J];Laser Journal;2004-06
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