Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Opto-Electronic Engineering》 2006-02
Add to Favorite Get Latest Update

Study on imaging interferometric lithography

ZHANG Jin1,FENG Bo-ru1,LIU Juan1, 2 (1. State Key Laboratory of Optical Technologies for Microfabrication, the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China; 2. The Institute of Electronics Engineering, the Chinese Academy of Engineering Physics, Mianyang 621900, China)  
Imaging Interferometric Lithography (IIL) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system. In this article, the principle of IIL is presented, a kind of experiment system is introduced and the modeling and experiment results are given. The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
【Fund】: 国家自然科学基金资助(60276043)
【CateGory Index】: TN305.7
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
【References】
Chinese Journal Full-text Database 1 Hits
1 Chen Xin1,2,Zhao Qing1,Fang Liang2,Wang Changtao2,Luo Xiangang2(1.School of Physical Electronics,University of Electronic Science and Technology of China,Chengdu 610054,China;2.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,P.O.Box 350,Chengdu 610209,China);Fabrication of 100nm mask by laser interference lithography[J];High Power Laser and Particle Beams;2011-03
【Citations】
Chinese Journal Full-text Database 2 Hits
1 Liu Juan~(1,2),Zhang Jin~1,and Feng Boru~1(1 State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China)(2 Graduate School of Chinese Academy of Science,Beijing 100039,China);Comparison Between Imaging Interferometric Lithography and Off-Axis Illumination Lithography[J];Chinese Journal of Semiconductors;2005-07
2 FENG Bo-ru1,ZHANG Jin1,LIU Juan1, 2(1. The State Key Lab.of Optical Technologies for Microfabrication,the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China; 2. The Institute of Electronics Engineering, the Chinese Academy of Engineering Physics, Mianyang 621900, China);Imaging interferometric lithography with bidirection biased illumination[J];Opto-Electronic Engineering;2006-01
【Co-citations】
Chinese Journal Full-text Database 1 Hits
1 FENG Bo-ru1,ZHANG Jin1,LIU Juan1, 2(1. The State Key Lab.of Optical Technologies for Microfabrication,the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China; 2. The Institute of Electronics Engineering, the Chinese Academy of Engineering Physics, Mianyang 621900, China);Imaging interferometric lithography with bidirection biased illumination[J];Opto-Electronic Engineering;2006-01
【Co-references】
Chinese Journal Full-text Database 1 Hits
1 ZHANG Jin1, 2,FENG Bo-ru1,GUO Yong-kang2 (1. State Key Laboratory of Optical Technologies for Microfabrication, the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China; 2. Department of Physics, Sichuan University, Chengdu 610064, China );Comparison between double exposure with two laser beams interference and single exposure with four laser beams[J];Opto-electronic Engineering;2005-12
【Secondary Citations】
Chinese Journal Full-text Database 7 Hits
1 FENG Bo-ru 1 ,ZHANG Jin 1,2 ,ZONG De-rong 1 ,JIANG Shi-lei 1 ,SU Ping 1,2 ,CHEN Bao-qin 3 ,CHEN Fen 4(1.State Key Lab of Optical Technologies for Microfabrication,Institute of Optics&Electronics,Chinese Academy of S;Study of interferometric lithography without masks[J];Semiconductor Information;2002-03
2 Liu Juan~(1,2),Zhang Jin~1,and Feng Boru~1(1 State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China)(2 Graduate School of Chinese Academy of Science,Beijing 100039,China);Comparison Between Imaging Interferometric Lithography and Off-Axis Illumination Lithography[J];Chinese Journal of Semiconductors;2005-07
3 FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of;Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction[J];Opto-electronic Engineering;2001-01
4 ZHANG Jin1,2, FENG Bo-ru2, GUO Yong-kang1, JIANG Shi-lei2, ZONG De-rong2, DU Jing-lei1, ZENG Yang-su1, GAO Fu-hua1 (1. Department of Physics, Sichuan University, Chengdu 610064, China; 2. State Key Laboratory of Optical Technologies for Microfabrication,;Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area[J];Opto-electronic Engineering;2001-06
5 FENG Bo-ru1, ZHANG Jin1,2, GUO Yong-kang2 (1. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; 2. Department of Physics, Sichuan University, Chengdu 610064, China);Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography[J];Opto-electronic Engineering;2004-02
6 LIU Juan, FENG Bo-ru, ZHANG Jin ( 1. State Key Laboratory of Optical Technologies for Microfabrication, The Institute of Optics and Electronics, The Chinese Academy of Sciences, Chengdu 610209, China ; 2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China );Imaging interferometric lithography and its spatial frequency analysis[J];Opto-electronic Engineering;2004-10
7 Zhang Jin 1,2,Feng Boru 2, Guo Yongkang 1 1 Department of Physics, Sichuan University,Chengdu 610064, China 2 State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;Theoretical Analysis for Fabricating Nanometer Hole Array with 4 Laser Beams Interference Lithography[J];Acta Photonica Sinica;2003-04
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved