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《Opto-Electronic Engineering》 2012-08
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Fifth-order S-curve Trajectory Planning for Step and Scan Operation of Precision Wafer Stage

WU Zhi-peng,CHEN Xing-lin(Department of Control Science and Engineering,Harbin Institute of Technology,Harbin 150001,China)  
To reduce the acceleration time and improve the stability of the scanning speed during the exposure process of the wafer stage,a fifth-order S-curve is proposed.The third derivative of the acceleration is designed as a constant,and the position and speed formulas are calculated based on integration method.Optimization index with minimum time and jerk is proposed,and a modified fifth-order S-curve is designed.Simulation results show that the S-cure can ensure that the wafer stage speeds up to the scanning speed quickly and can stabilize in a short time.The modified S-curve can reduce the step time effectively,and the step movement curve is smooth.
【Fund】: 国家科技重大专项资助项目(2009ZX02207)
【CateGory Index】: TN305.7
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