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《Journal of Functional Materials》 2004-02
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Deposition of TiO_2 film onto stainless steel by reactive magnetron sputtering and photocatalytic activity of TiO_2 film

ZHANG Zong-quan, YUAN Sheng-li, YANG Zong-li, JI Shu-li, ZHANG Jian-min (Collage of Physics and Information Technology, Shanxi Normal University, Xi′an 710062,China)  
TiO_2 film with a thickness of 300nm was deposited on stainless steel with a 25nm Ti buffer layer, by DC reactive magnetron sputtering at a pressure of 0.9Pa, the pressure ratio of O_2 to Ar of 1∶6 and the substrate temperature of 270～280℃. The TiO_2 film was thermally treated in oxygen vapor at 420℃, XRD analysis showes that the film was composed of TiO_2 anatase and rutile crystals with the ingredient of anatase of 64% and the size of crystal of 14nm. The bending test states the binding strength between film and substrate was high, the experiment on degrading phenol expresses the film was of phatocatalytic activity.
【Fund】： 国家自然科学基金资助项目(50271038);; 陕西师范大学重点科研基金资助项目(SD200303)
【CateGory Index】： TB383
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