Influence of heat-treatment temperature on ZnO thin film prepared by sol-gel method
GU Kun-ming~1,LUO Gui-qing~1, XU Jing-xing~1, TANG Jiao-ning~1, LI Jun-qin~1, YANG Qin-peng~1, LI Cui-hua~2 (1.Department of Materials Science and Engineering, Shenzhen University; Shenzhen Key Laboratory of Special Functional Materials, Shenzhen 518060, China; 2.Chemical and Biological Department, Normal college of Shenzhen University, Shenzhen 518060,China)
ZnO thin films with high c-axis orientation were prepared on polished Si 111 substrates by using spin coating method. DSC and XRD tests show that the optimal heat-treatment temperature for the sol-gel system to form ZnO film is about 450℃. The disadvantage influence on orientation can take place for higher temperature. Surface morphologies of the films were investigated by SEM, which show the high c-axis orientation of grains with average size of 50~100 nm.