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《Optics & Optoelectronic Technology》 2008-06
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Controlling of Holographic Grating Mask Stress

CHEN Nan-shu HUANG Yuan-shen ZHANG Da-wei(Optical & Electronic Information Engineering College,University of Shanghai for Science and Technology,Shanghai 200093,China)  
By using the interference method and the calculated result of Stoney formula,the stress of photoresist thin film spinned on the SiO2 substrate was researched.The uniformity of film thickness was studied using microscope.With varying acceleration,rotating speed and spinning time,the spinning experiment was done.The results show that the residual stress of photoresist thin film decreases,while the uniformity of thin film thickness gets to the bad,with the reducing of acceleration at the same rotational speed.When the rotating speed is 4 000 rpm,the uniformity of the photoresist thin film is good.
【Fund】: 上海市重点实验室登山计划(05DZ22016)资助项目;; 上海市科委(07DZ22026)资助项目;; 上海市教委(06EZ011)资助项目
【CateGory Index】: O484
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【Citations】
Chinese Journal Full-text Database 10 Hits
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【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 WANG Xin-yu;SHI Meng-ran;North China Research Institute of Electro-optics;;Study on interface characteristics of metal structure on Ge window for MEOMS packaging[J];激光与红外;2016-04
2 WANG Zhi-jun;LI Yang-ping;ZHOU Xiao-yi;LI Jun;LIU Zheng-tang;State Key Laboratory of Solidification Processing,School of Material Science and Engineering,Northwestern Polytechnical University;;Spin coating of UV-curable resist for imprinting long-wave infrared subwavelength structures[J];光学精密工程;2014-08
3 He Kuan;Yi Tao;Liu Shenye;Niu Jiebin;Chen Baoqin;Zhu Xiaoli;Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences;Research Center of Laser Fusion,Chinese Academy of Engineering Physics;;Design and Fabrication of High-Line-Density Dual Gratings for X-Rays[J];微纳电子技术;2014-06
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【Secondary Citations】
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1 WU Ping,QIU Hong,HUANG Xiao-ling,TIAN Yue,ZHAO Xue-dan,PAN Li-qing,WANG Feng-ping,LUO Sheng(Department of Physics,School of Applied Science,University of Science and Technology Beijing,Beijing 100083,China);A group of experiments of metal film preparation and physical property measurement[J];大学物理;2006-05
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6 XU Xiang-Dong 1,2, HONG Yi-Lin 2FU Shao-Jun 2WANG Zhan-Shan 1 (1 Department of Physics, Tongji University, Shanghai 200092, China) (2 National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029,China);Holographic ion beam etched diffraction gratings[J];物理;2004-05
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