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《Acta Optica Sinica》 2008-10
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Study on Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Electron Gun Evaporation

Gan Shuyi1,2 Liu Zhengkun1 Sheng Bin1 Xu Xiangdong1 Hong Yilin1 Liu Ying1Zhou Hongjun1 Huo Tonglin1 Fu Shaojun11National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei,Anhui 230029,China2School of Mechanical and Automobile Engineering,Hefei University of Technology,Hefei,Anhui 230009,China  
Ir is an important vacuum-ultraviolet(VUV) reflecting material,and has various applications in hi-tech fields including solar physics,cosmic physics,life science,and synchrotron radiation.The reflective performance of Ir film in the VUV wavelength region was studied theoretically and experimentally.Based on the theoretical model of single metal layer on absorbing substrate,the optimum calculation was performed for Ir layer of various thickness on K9 glass and quartz substrate in the VUV wavelength region.Considering the calculation results and previous research,single layer Ir films of different thickness were fabricated on K9 glass and quartz substrate by electron gun evaporation system,and nearly 30% normal incident reflectivity at 120 nm incident wavelength was obtained,which corresponded to the optimum thickness of Ir layer of 12 nm.Ir layer of too thin or thick thickness cannot get high reflectivity.The annealing of the layer benefits the release of tension,but it also causes the increase of average size of Ir grain and degradation of the reflectivity.
【CateGory Index】: TB43
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【Citations】
Chinese Journal Full-text Database 6 Hits
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【Co-citations】
Chinese Journal Full-text Database 10 Hits
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