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《Acta Optica Sinica》 2010-06
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Study on Optical Property of TiN_x/Ag/TiN_x Multilayer Films

Huang Jiamu1,2 Jiang Pan2 Dong Siqin2(1 National Magnesium Alloys Engineering Research Center,Chongqing University,Chongqing 400044,China2 College of Materials Science and Engineering,Chongqing University,Chongqing 400045,China)  
TiNx/Ag/TiNx multilayer films are deposited on glass slides by magnetron sputtering.The crystalline structure of multilayer films and chemical composition of TiNx thin film are characterized by X-ray diffraction and X-ray photoelectron spectroscopy(XPS).US-VIS absorption spectrophotometer is used to investigate the effect of nitrogen flow rate and each layer of multilayer films on visible transparency.The results indicate that the TiNx thin films are amorphous and Ag thin film is crystalline.The TiNx thin film,on the surface of which exists a lot of Ti-O bonds,bears responsibility for improving the far-infrared reflectivity of multilayer film.The transmittance of films,firstly increases and then decreases with the increasing of thickness of Ag thin film,and it is improved with the increase of nitrogen flow rate.When the nitrogen flow rate is 55 cm3/s,and the conformation of multilayer film is TiNx(16 nm)/Ag(16 nm)/TiNx(32 nm),the visible transmittance of multilayer film reaches up to 85% at the wavelength of 550nm,the far-infrared reflectance is up to 92% and the emissivity is 0.0925,which presents very good optical properties of low-E glass.
【CateGory Index】: O614.411;O484.41
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