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《Acta Optica Sinica》 2014-08
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Active Compensation of Thermal Aberrations in Lithographic Projection Lens

Chen Hua;Su Dongqi;Sui Yongxin;Zhang Mingchao;Tian Wei;Yang Huaijiang;Zhang Wei;State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences;  
Thermal aberrations caused by absorption of laser energy are the key factors that make the image performance of lithographic projection lens degrade.Compensation of thermal aberrations is inevitable.A new compensation method of wavefront aberrations by controllable heating of a lens using film heater matrix is presented.For the refractive index of glass changes with temperature,heating on the periphery of a lens will produce a controlled wavefront change that can compensate for the system′s thermal aberrations.The feasibility of the compensation method is validated by compensating the wavefront of a plate lens.The results show that the wavefront of lens changes from12.52 nm root mean square(RMS)to 2.95 nm(RMS)after compensation,indicating that the compensation method is effective and feasible.
【Fund】: 国家重大科技专项基金
【CateGory Index】: TN305.7
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