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《Optical Instruments》 2010-04
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Technical status and developing trend of lithographic tools

PENG Yifan,YUAN Bo,CAO Xiangqun (NERC for Optical Instrument,State Key Laboratory of Modern Optical Instrumentation, ZhejiangUniversity,Hangzhou 310027,China)  
This paper mainly presents the technical status and developing trend of lithography, which is used in the manufacture of large-scale integrated circuit.Firstly,the status of lithography technology at home and abroad is discussed on the basis of the investigation for the research and production of lithographic tools.Then several key techniques to improve the performance of lithographic tools are emphatically analyzed.In the end,the research progress and developing direction of the next-generation lithography are briefly introduced.
【Fund】: “国家大学生创新性实验计划”资助项目(No.3 2956)
【CateGory Index】: TN305.7
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