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《Chinese Journal of High Pressure Physics》 2001-04
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CRYSTALLIZATION OF PLATING-MANGANIN PIEZORESISTANCE GAUGES

SHI Shang chun 1,2 ,DONG Shi 1,2 ,HUANG Yue 1,2 ,ZHOU Hong ren 3(1.Laboratory for Shock Wave and Detonation Physics Research,Institute of Fluid Physics,CAEP,Mianyang 621900,China; 2.Institute of Applied Physics,Sichuan University,Chengdu  
Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.Although the film was the same metal construction feature as manganin alloy does,it has smaller crystalloid size,twice resistivity and less piezoresistance coefficient than the alloy.However,the average crystal size increases by about 20%,and the resistivity decreases by 50%.The piezoresistance coefficient of the film annealed under 673K in vacuum increased to 2.0~2.6(10 -2 /GPa) in 0~80GPa.
【CateGory Index】: O521.3
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