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《Acta Photonica Sinica》 2006-09
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Imaging Model for DMD-Based Gray-tone Lithography System

Guo Xiaowei1, Du Jinglei1, Luo Boliang1, Guo Yongkang 1, Du Chunlei2 1 Institute of Information Optics, Sichuan University, Chengdu 610064 2 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 6102 09  
The characteristic of the gray-tone pattern generate d by DMD is discussed and an imaging model for describing the digital gray-tone lithography process is developed. In addition, the effects of DMD operation mod e and the parameters of imaging system to the distribution of the exposure dose on the photoresist are simulated and discussed.The model will be helpful for th e experimental research on the digital lithography.
【Fund】: 国家自然科学基金(60376021);; 微细加工国家重点实验基金资助
【CateGory Index】: TN405
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